Texture etching solution composition and texture etching method for crystalline silicon wafer

Abstract

The invention provides a texture etching liquid composition and a texture etching method for a crystalline silicon wafer. The present invention provides a reaction product containing an alkali compound and a compound with a specific solubility index and an alkali metal (salt), to control the difference in etching speed with respect to the silicon crystal direction when a fine pyramid structure is formed on the surface of a crystalline silicon wafer, and to prevent alkali Compound-induced over-etching, thereby minimizing the quality deviation of textures at different positions and increasing light efficiency. A texture etching liquid composition and a texture etching method for a crystalline silicon wafer.

Description

technical field [0001] The present invention relates to a texture etching liquid composition and a texture etching method (TEXTURE ETCHINGSOLUTION COMPOSITION AND TEXTURE ETCHING METHOD OF CRYSTALLINE SILICONWAFERS). Background technique [0002] In recent years, a solar cell, which has spread rapidly, is an electronic device that directly converts solar energy, which is clean energy, into electricity as a next-generation energy source. A solar cell is composed of a PN junction semiconductor substrate in which an N-type silicon semiconductor layer is formed by diffusing phosphorus on the surface of a P-type silicon semiconductor to which boron is added. [0003] When light such as sunlight is irradiated to the substrate with an electric field formed by the PN junction, the electrons (-) and holes (+) in the semiconductor are excited, and they are in a state of moving freely inside the semiconductor. In the electric field generated by the junction, electrons (-) become N-ty...

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Problems solved by technology

However, these etching solutions contain isopropyl alcohol with a low boiling point, which must be added in the texturing process, so it is uneconomical in terms of productivity and cost. Due to the additional addition of isopropyl alcohol, a temperature gradient of the etching solution is generated, and the silicon wafer Variations in texture quality at different locations on the surface become larger and uniformity can be reduced

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