Array substrate and manufacture method thereof and display device

An array substrate and substrate substrate technology, applied in optics, instruments, electrical components, etc., can solve the problems of high production cost and low yield rate, and achieve the effect of improving yield rate, reducing the number of times, and reducing one patterning process.

Active Publication Date: 2015-09-23
BOE TECH GRP CO LTD +1
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, since the number of patterning processes directly affects the production cost and the yield rate, that is, the more the patterning process, the longer the production cycle, the higher the production cost, and the lower the yield rate. Therefore, how to reduce the The number of composition processes is a technical problem that needs to be solved urgently

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Array substrate and manufacture method thereof and display device
  • Array substrate and manufacture method thereof and display device
  • Array substrate and manufacture method thereof and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] An embodiment of the present invention provides an array substrate, such as figure 2 and image 3 As shown, the array substrate includes a base substrate 1 and a gate 2 stacked on the base substrate 1, a gate insulating layer 3 and an active layer 4. The array substrate also includes a passivation layer disposed on the active layer 4. The passivation layer 5 and the source electrode 6, the drain electrode 7, the first electrode 8 and the second electrode 9 arranged on the same layer on the passivation layer 5; wherein, the first via hole 51 is arranged on the passivation layer 5, and the second via hole 51 is arranged on the passivation layer 5. A via hole 51 includes two opposite inclined sides; the first electrode 8 at least partially covers one side of the first via hole 51, the second electrode 9 at least partially covers the other side of the first via hole 51, and the second electrode 9 It is electrically connected with the common electrode lead 10; the second v...

Embodiment 2

[0047] An embodiment of the present invention provides a method for manufacturing an array substrate, such as Figure 4 shown, including:

[0048] In step 401, a pattern including a gate is formed on the base substrate through a first patterning process. Exemplarily, a conductive layer is formed on the base substrate by methods such as plasma-enhanced chemical vapor deposition, sputtering or thermal evaporation, a photoresist is coated on the conductive layer, and a mask plate with a grid pattern is used Covering the conductive layer coated with photoresist, after exposure, development, etching and other steps, a pattern including the gate is formed.

[0049] Step 402 , forming a gate insulating layer on the base substrate formed with a pattern including a gate. Exemplarily, the gate insulating layer is formed on the base substrate on which the pattern including the gate is formed by plasma enhanced chemical vapor deposition, sputtering or thermal evaporation.

[0050] In s...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention discloses an array substrate and a manufacture method thereof and a display device, and relates to the technical field of display. The times of a picturing technology adopted in the manufacture process of the array substrate can be decreased. The array substrate comprises an underlayment substrate and a gate, a gate insulation layer and an active layer, and further comprises a passivation layer arranged on the active layer and a source electrode, a drain electrode, a first electrode and a second electrode which are arranged on the passivation layer in a same-layer mode; the passivation layer is provided with a first via hole which comprises two oppositely arranged inclined side surfaces; the first electrode at least partially covers one side surface of the first via hole, the second electrode at least partially covers the other side surface of the first via hole, and the second electrode is in electronic connection with a lead of a common electrode; the passivation layer is further provided with a second via hole, the source electrode and the drain electrode are connected with the active layer through the second via hole, and the first electrode is in electronic connection with the source electrode or the drain electrode. The array substrate can be applied to the display device.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to an array substrate, a manufacturing method thereof, and a display device. Background technique [0002] Advanced-Super Dimensional Switching (abbreviation: ADS) display technology forms a multi-dimensional electric field through the electric field generated at the edge of the slit electrode in the same plane and the electric field generated between the slit electrode layer and the plate electrode layer, so that the liquid crystal All aligned liquid crystal molecules between the slit electrodes in the cell and above the slit electrodes can be rotated, thereby improving the working efficiency of the liquid crystal. [0003] Generally, a display device adopting ADS display technology includes an array substrate, such as figure 1 As shown, the array substrate includes a base substrate 1' and a gate electrode 2', a gate insulating layer 3', an active layer 4', a pixel electr...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/13G02F1/1362
CPCG02F1/1303G02F1/1362G02F1/136231G02F1/134309G02F1/134363G02F1/136227H01L27/124H01L27/1248H01L29/41733
Inventor 张鹏举杜晓健徐斌
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap