High-voltage and inverted LED (light emitting diode) chip and manufacturing method thereof
A technology of LED chip and manufacturing method, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of unfavorable secondary optical design and light distribution, the reliability of light blocking of interconnection lines, and the increase in volume of light-emitting modules, etc., to achieve The power supply combines the effects of low cost, process optimization, passivation and leakage
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[0031] All features disclosed in this specification, or steps in all methods or processes disclosed, may be combined in any manner, except for mutually exclusive features and / or steps.
[0032] Any feature disclosed in this specification (including any appended claims, abstract and drawings), unless expressly stated otherwise, may be replaced by alternative features which are equivalent or serve a similar purpose. Unless expressly stated otherwise, each feature is only one example of a series of equivalent or similar features.
[0033] Such as figure 1 As shown, a high-voltage flip-chip LED chip manufacturing method includes a substrate 7 and a sapphire substrate 1, and the lower surface of the sapphire substrate (1) is sequentially provided with an n-type GaN layer 2, a quantum well active region 3, p type GaN layer 4, wherein, on the sapphire substrate 1, a chip interconnection region 101 and a scribe region 102 are provided; the walls of the chip interconnection region 1...
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