Anticorrosive wear-resistant manganese-based phosphating liquid and preparation method thereof
A wear-resistant manganese-based phosphorus and wear-resistant manganese-based technology, applied in the field of phosphating solution, can solve the problems of short corrosion resistance time of bare film and more sediment, and achieve the effects of less sediment, longer service life and high pass rate
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specific Embodiment approach 1
[0018] Embodiment 1. In this embodiment, the anti-corrosion and wear-resistant manganese-based phosphating solution is composed of independently packaged A component and B component.
[0019] The A component is composed of 25% phosphoric acid, 30% manganese dihydrogen phosphate, 0.5% sodium nitrate, 0.03% zinc nitrate, 10% nickel nitrate, 0.4% sodium tartrate and the rest of water by mass percentage;
[0020] The B component is composed of 20% phosphoric acid, 40% sodium dihydrogen phosphate, 15% sodium nitrate and the rest of water according to mass percentage.
[0021] The preparation method of anti-corrosion and wear-resistant manganese-based phosphating solution is carried out as follows:
[0022] Component A: add water accounting for one-third of the total mass of water in component A to the reactor, add phosphoric acid, manganese dihydrogen phosphate in turn while stirring, and then add accelerator, zinc nitrate, nickel nitrate and complexing agent , and then add the re...
specific Embodiment approach 2
[0028] Specific embodiment 2. The difference between this embodiment and specific embodiment 1 is that the accelerators in component A and component B are both hydrogen peroxide. Others are the same as in the first embodiment.
[0029] In this embodiment, the titration of the mixed solution of copper sulfate, hydrochloric acid and sodium chloride obtained by treating the bare film with the phosphating solution for 8 to 10 minutes can exceed 7 minutes or more.
specific Embodiment approach 3
[0030] Specific embodiment 3. The difference between this embodiment and specific embodiment 1 is that the accelerators in components A and B are sodium nitrite. Others are the same as in the first embodiment.
[0031] In this embodiment, the titration of the mixed solution of copper sulfate, hydrochloric acid, and sodium chloride obtained by treating the bare film with the phosphating solution for 10 to 12 minutes all exceeds 7 minutes.
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