Immersion liquid control device for immersed lithography machine

Abstract

The invention discloses an immersion liquid control device for an immersed lithography machine. The immersion liquid control device comprises an immersion unit base body and a recycling net mesh plate, wherein a round thin lining plate is arranged at the center of the base body; the periphery of the base body is provided with an annular cube structure; a rectangular through hole is formed in the center of the round thin lining plate; horizontal liquid injecting cavities and horizontal liquid injecting openings are symmetrically formed in the annular cube part; horizontal liquid returning cavities and horizontal liquid returning openings are symmetrically formed in the annular cube part; air injecting openings and vertical recycling openings are formed in the side walls of the immersion unit base body at two horizontal sides of the horizontal liquid injecting openings and the horizontal liquid returning openings; and a uniform immersion liquid buffering groove, a vertical recycling groove and an air injecting groove are formed in the lower surface of the annular cube part of the immersion unit base body outwards in sequence. The immersion liquid control device can be used for effectively increasing the use rate of an immersion liquid and enhancing the stability of a core flow field area, so that the scanning speed of a silicon wafer is effectively increased, the vertical recycling rate of an immersion unit is increased, the vibration of a flow field is reduced, and the stable updating and a dynamic packing control function on the immersion liquid can be realized.

Description

technical field [0001] The invention relates to a flow field dynamic sealing device, in particular to an immersion liquid control device for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly based on optical lithography. It uses the optical system to accurately project and expose the pattern on the mask to the silicon coated with photoresist. a. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist. [0003] The immersion lithography (ImmersionLithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the silicon wafer, which improves the numerical aperture (NA) of the projection objective lens compared to the dry lithography machine with a gas intermediate medium ...

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of sealing the slit flow field in partial immersion lithography technology, the object of the present invention is to provide an immersion liquid control device for immersion lithography machine, which uses an air-tight structure at the edge of the flow field to prevent the slit flow field from liquid leakage, while using the method of vertical negative pressure recovery to restrain the immersion liquid

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