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Device and method for measuring high depth-diameter ratio microporous recast layer on transparent material

A high aspect ratio, transparent material technology, applied in the field of optical measurement, can solve the problems of inability to accurately measure the quality of micropores, inability to obtain the thickness of the recast layer, etc., and achieve the effects of fast measurement speed, convenient measurement and simple device structure.

Active Publication Date: 2015-12-16
BEIJING INSTITUTE OF TECHNOLOGYGY
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Problems solved by technology

[0006] The purpose of the present invention is to solve the problem in the prior art that the thickness of the recast layer cannot be obtained only by measuring the geometric shape and inner wall conditions, and then the quality of the micropores cannot be accurately measured, and to provide a recast layer with high depth-to-diameter ratio micropores on transparent materials A measuring device and method, which can accurately measure the thickness and refractive index of the recast layer

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  • Device and method for measuring high depth-diameter ratio microporous recast layer on transparent material

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Embodiment Construction

[0034] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0035] During the process of microhole processing, considering the influence of thermal effect, impact stress, etc., the density and lattice structure of the material around the microhole will change, which will lead to changes in the optical properties of the surrounding area of ​​the microhole. Therefore, the thickness of the recast layer can be determined by measuring the change of the refractive index in the peripheral area of ​​the microhole. Due to the small size of a single microhole, it is difficult to measure directly, so we propose a method to process a large number of microholes into a grating structure, and then measure the optical properties of the grating (mainly measure the zero-order diffraction efficiency of the grating), and calculate the To determine the method of refractive index around the microhole.

[0036] The structure of the m...

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Abstract

The invention relates to a device and method for measuring a high depth-diameter ratio microporous recast layer on a transparent material and belongs to the technical field of optical measurement. The device comprises a linear coherent light source, a polarizing device, a beam compressing device, a beam expanding device, a polarization detection device, a light intensity detector and a data processing computer. In processing, a material lattice structure and density in a transparent material processing zone are changed so that optical properties (such as a refractive index) in a processing influence zone are changed. Through change of refractive indexes of materials nearby measurement micropore walls, recast layer thickness and refractive index change is determined. The method for measuring a high depth-diameter ratio microporous recast layer on a transparent material can be widely used in fields of micropore processing field research, micropore processing technology improvement and micropore application research. The method and device can realize accurate measurement of a microporous recast layer on a transparent material.

Description

technical field [0001] The invention relates to a measuring device and method for a high depth-to-diameter ratio microporous recast layer on a transparent material, belonging to the technical field of optical measurement. Background technique [0002] Wide bandgap transparent materials have many excellent physical and chemical properties, such as high light transmission, good chemical stability, high hardness, excellent insulation properties, etc. Micropores are one of the main structures of many micro-devices (such as three-dimensional micro-nano optical devices, microfluidic devices, high-sensitivity sensor devices, etc.), and their quality has an important impact on the performance of micro-devices. Usually microhole processing methods include ultrafast laser technology, focused electron beam processing, focused ion beam processing, etc. [0003] Whether it is to study the micropore processing technology or the device containing the micropore structure, in order to obtai...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/41G01B11/06
Inventor 姜澜李晓炜刘洋
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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