Fault-tolerant control device of photoetching projection objective
A technology of lithography projection and fault-tolerant control, which is applied in photolithography exposure devices, micro-lithography exposure equipment, installation, etc., can solve problems such as the inability to recover the effective control of functional adjustment mechanisms, and achieve lithography accuracy and stability Reliable operation, effect of compensating thermal aberration
Active Publication Date: 2015-12-16
BEIJING GUOWANG OPTICAL TECH CO LTD
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[0004] The invention provides a fault-tolerant control device for lithography projection objective lens to solve the technical problem that the existing lithography projection objective lens cannot recover the effective control of the functional adjustment mechanism in the case of controller failure
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[0029] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and examples.
[0030] refer to figure 1 , a preferred embodiment of the present invention provides a fault-tolerant control device for a lithographic projection objective lens, including a piezoelectric driver 19 and a capacitive sensor 20 arranged in a lithographic projection objective lens 11, and the piezoelectric driver 19 is used to Finely adjust the adjustment mechanism located in the lithography projection objective lens 11, and the capacitive sensor 20 is used to detect the position of the adjustment mechanism in real time; the fault-tolerant control device of the lithography projection objective lens in this embodiment also includes: a signal acquisition board 9, a high-voltage drive board 17, main ...
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The invention discloses a fault-tolerant control device of a photoetching projection objective. The fault-tolerant control device comprises a piezoelectric actuator and a capacitance sensor, wherein the piezoelectric actuator and the capacitance sensor are arranged inside the photoetching projection objective. The fault-tolerant control device of the photoetching projection objective further comprises a signal collecting board, a high-voltage driving board, a master control single board computer and an auxiliary-control single board computer. The master control single board computer and the auxiliary-control single board computer form redundant control and are connected with the capacitance sensor through the signal collecting board to receive position signals detected by the capacitance sensor. The master control single board computer and the auxiliary-control single board computer are connected with the piezoelectric actuator through the high-voltage driving board to be used for generating instructions according to the received position signals to control the piezoelectric driver. Closed-loop accurate control over an adjusting mechanism inside the photoetching projection objective is achieved to compensate for thermal aberration, photoetching accuracy is guaranteed, and stable and reliable working of the control device is guaranteed through redundant control.
Description
technical field [0001] The present invention relates to the field of lithographic projection objective lens control, in particular to a fault-tolerant control device for lithographic projection objective lens. Background technique [0002] The lithography projection objective lens is an important ultra-precision optical system in the lithography machine. During the working process of the lithography machine, with the accumulation of exposure time, the lithography projection objective lens will produce thermal aberration due to the accumulation of laser thermal radiation effect. If it is not compensated, thermal aberration will directly deteriorate the lithography accuracy, and the functional adjustment mechanism is the main method used to compensate thermal aberration in lithography projection objective. [0003] The Chinese patent with the publication number CN101900862 discloses an invention titled a technical scheme of an axial micro-adjustment device for optical elements...
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IPC IPC(8): G03F7/20G02B7/02
Inventor 郭嘉亮李佩玥葛川郑楠隋永新杨怀江
Owner BEIJING GUOWANG OPTICAL TECH CO LTD