Vertical MOS power device and formation method thereof
A technology of power device and doping type, which is applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc. It can solve the problems of severe gate voltage waveform, increased device switching loss, and abnormal operation of devices, etc., and achieves low cost , Reduce switching loss, improve the effect of device switching speed
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[0017] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.
[0018] The first aspect of the present invention provides a planar vertical MOS power device. image 3 is a schematic structural diagram of a planar vertical MOS power device according to an embodiment of the present invention.
[0019] Such as image 3 As shown, the planar vertical MOS power device of this embodiment may include: a withstand voltage layer 301, a plurality of first doped type well regions 302, a plurality of second doped type source regions 303, a planar gate oxide layer 304, a planar A gate layer 305 , an insu...
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