Unlock instant, AI-driven research and patent intelligence for your innovation.

Vertical MOS power device and formation method thereof

A technology of power device and doping type, which is applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc. It can solve the problems of severe gate voltage waveform, increased device switching loss, and abnormal operation of devices, etc., and achieves low cost , Reduce switching loss, improve the effect of device switching speed

Inactive Publication Date: 2015-12-30
BYD CO LTD
View PDF5 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This leads to the fact that during the turn-on process, the gate voltage needs to maintain a period of charging time before it can continue to rise after reaching the Miller platform, and it needs to maintain a period of time after the gate voltage drops to the Miller platform during the turn-off process before it can continue to decline, which reduces the switching speed and at the same time greatly increases the switching losses of the device
Moreover, since the change of the anode voltage is often very large, its feedback may also cause a violent waveform of the gate voltage and form an oscillation, causing the device to malfunction or even burn out

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vertical MOS power device and formation method thereof
  • Vertical MOS power device and formation method thereof
  • Vertical MOS power device and formation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0018] The first aspect of the present invention provides a planar vertical MOS power device. image 3 is a schematic structural diagram of a planar vertical MOS power device according to an embodiment of the present invention.

[0019] Such as image 3 As shown, the planar vertical MOS power device of this embodiment may include: a withstand voltage layer 301, a plurality of first doped type well regions 302, a plurality of second doped type source regions 303, a planar gate oxide layer 304, a planar A gate layer 305 , an insu...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a vertical MOS power device. The vertical MOS power device can be a plane type or a groove type. In the vertical MOS power device, the entire or part of a grid electrode which generates a Miller capacitance is eliminated, the Miller capacitance is reduced distinctly, so that the feedback effect of voltage changes of a second electrode on the grid electrode voltage is eliminated or reduced distinctly, and therefore a Miller platform or an oscillation phenomenon in the switching process is avoided or reduced, the switching time of a device is shortened, the switch speed of the device is improved, the switch consumption is reduced, the power device is made safer and more reliable. The vertical MOS power device has advantages of being simple in structure, being low in cost and the like. The invention also provides a formation method of the vertical MOS power device.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a vertical MOS power device and a forming method thereof. Background technique [0002] The gate of the vertical MOS power device is driven by voltage, which has the advantages of fast switching speed and simple driving circuit, and is widely used in low-voltage and medium-high voltage fields. Common MOS type power devices are mainly divided into planar type and trench type according to the shape of the gate structure and the direction of the channel. figure 1 It is a schematic diagram of a traditional planar vertical MOS power device. Among them, 101 is a voltage-resistant layer, 102 is a P-type well region, 103 is an n-type source region, 104 is a gate oxide layer, 105 is a gate, 106 is an insulating layer dielectric, 107 is a cathode, and the anode is under the voltage-resistant layer 101 Not drawn. The portion of the surface of the P-type well region 102 opposite to...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/78H01L29/06H01L21/336
Inventor 黄宝伟肖秀光刘鹏飞吴海平
Owner BYD CO LTD
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More