Separation method of mixed solution containing selenium and tellurium in copper anode mud treatment process
A technology of mixed solution and treatment process, applied in the field of tellurium extraction and selenium, can solve the problems of high content of tellurium in crude selenium, high content of impurity copper in selenium-tellurium alloy, large consumption of reducing agent, etc., and achieve the effect of reducing the content of impurities
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0027] A mixed solution containing selenium and tellurium, including 22.35g / L selenium, 2.542g / L tellurium, 24.32g / L copper, and 13g / L chloride ion concentration. First supplement the chloride ion concentration to 130g / L, and adopt the method of the present invention to reduce the solution twice. In the first reduction, when the concentration of sulfuric acid is 220g / L, liquid sulfur dioxide is added to reduce the solution. After 3 hours of reaction, the crude selenium and the liquid after the first reduction are produced after plate and frame pressure filtration. The crude selenium contains 75.78% of selenium and contains Tellurium 0.443%, copper 1.121%. Compared with the original process, the average selenium content is 72.041%, the tellurium content is 1.615%, and the copper content is 2.165%, which is significantly improved. In the secondary reduction, continue to add liquid sulfur dioxide and react for 1.4 hours. After the secondary reduction, the selenium-tellurium allo...
Embodiment 2
[0029] A mixed solution containing selenium and tellurium, including 22.35g / L selenium, 2.542g / L tellurium, 24.32g / L copper, and 13g / L chloride ion concentration. First replenish the chloride ion concentration to 120g / L, and adopt the method of the present invention to reduce the solution twice. In the primary reduction, the concentration of sulfuric acid was controlled to be 250g / L, and the solution was reduced by liquid sulfur dioxide. After 4 hours of reaction, the crude selenium and the liquid after primary reduction were produced after plate and frame pressure filtration. The crude selenium contained 76.772% of selenium, containing Tellurium 0.452%, copper 1.006%. Compared with the original process, the average selenium content is 72.041%, the tellurium content is 1.615%, and the copper content is 2.165%, which is significantly improved. In the secondary reduction, continue to add liquid sulfur dioxide and react for 1.3 hours. The selenium-tellurium alloy produced after ...
Embodiment 3
[0031] A mixed solution containing selenium and tellurium, including 22.35g / L selenium, 2.542g / L tellurium, 24.32g / L copper, and 13g / L chloride ion concentration. First replenish the chloride ion concentration to 140g / L, and adopt the method of the present invention to reduce the solution twice. In the primary reduction, the concentration of sulfuric acid is controlled at 240g / L, and the solution is reduced by liquid sulfur dioxide. After 3.2 hours of reaction, the crude selenium and the primary reduction liquid are produced after plate and frame pressure filtration. The crude selenium contains 77.633% of selenium, Contains 0.478% tellurium and 0.993% copper. Compared with the original process, the average selenium content is 72.041%, the tellurium content is 1.615%, and the copper content is 2.165%, which is significantly improved. In the secondary reduction, continue to add liquid sulfur dioxide and react for 1.2 hours. The selenium-tellurium alloy produced after the second...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com