Modeling method for radio frequency MOS device and test structure
A technology for MOS devices and test structures, applied in the field of semiconductors, can solve the problems of limited flexibility, difficulties, and limitations of model correction methods, and achieve the effect of improving flexibility and improving accuracy
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[0051] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be further described below in conjunction with the accompanying drawings. Of course, the present invention is not limited to this specific embodiment, and general replacements known to those skilled in the art are also covered within the protection scope of the present invention.
[0052] The following is attached Figure 1-11 The present invention will be described in further detail with specific examples. It should be noted that the drawings are all in a very simplified form, using imprecise scales, and are only used to facilitate and clearly achieve the purpose of assisting in describing the present embodiment.
[0053] For this example, see figure 1 The MOS device test structure includes an intrinsic MOS device, a first interconnection layer located on the intrinsic MOS device, a first extraction pole and a first contact structure; the ...
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