The invention discloses a modeling method of an MOS device, and the method comprises the following steps: S01, constructing a model circuit of the MOS device, wherein the model circuit comprises an intrinsic transistor, a substrate parasitic resistor, a parasitic capacitor, a parasitic diode, a grid parasitic resistor inductance network, a source parasitic resistor inductance network and a drain parasitic resistor inductance network; S02, determining models and size parameters of an intrinsic transistor and a parasitic diode in the model circuit; S03, respectively determining parasitic elementvalues of the source parasitic resistance inductance network and the drain parasitic resistance inductance network by adopting an electromagnetic simulation method; S04, determining parasitic elementvalues of the substrate parasitic resistance, parasitic capacitance and grid parasitic resistance inductance network based on the test data; and S05, substituting the calculated parasitic element value into the model circuit. The model circuit comprises the parasitic resistance inductance network of each connection path, and the model is wider in application range and can be suitable for millimeter waves and other frequency bands.