A kind of production technology of double-sided pcb board
A technology of PCB board and production process, applied in the field of production process of double-sided PCB board, can solve the problems of complicated production process and high production cost, and achieve the effect of excellent oxidation resistance, good air tightness and no burr.
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Embodiment 1
[0036] A kind of production technology of double-sided PCB board, comprises the following steps:
[0037] (1) Double-sided copper foil substrate pretreatment: Cut the double-sided copper foil substrate to the required size according to the layout diagram, then open positioning holes at the edge of the double-sided copper foil substrate, and finally make the two sides of the double-sided copper foil substrate Carry out surface pickling, surface brushing, water washing and drying in sequence;
[0038] (2) Line coating exposure treatment: use an ink coating wheel to coat a photosensitive ink layer on the surface of the double-sided copper foil substrate, and perform baking and drying treatment on the photosensitive ink layer, and finally dry the double-sided copper foil substrate. Line film exposure processing;
[0039] (3) Line development, etching, and ink removal treatment: place the double-sided copper foil substrate in a developing machine for development treatment, develop...
Embodiment 2
[0055] The difference between this embodiment and embodiment 1 is:
[0056] The acidic solution used in the pickling treatment in the step (1) and the step (4) is a sulfuric acid solution with a mass concentration of 4%; the surface scrubbing treatment in the step (1) and the step (4) uses a 500-mesh nylon mill Brush for scrubbing.
[0057] The thickness of the photosensitive ink layer in the step (2) is 9um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 125°C, and the baking speed is 5m / min; The thickness of the solder resist ink layer is 25um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 105°C, and the baking speed is 5m / min.
[0058] The exposure energy scale is controlled at 8 grids when the line film exposure treatment is performed in the step (2); the exposure energy scale is controlled at 9 grids when the solder resist film exposure treatment is performed in the step (4).
[0059] In the step...
Embodiment 3
[0066] The difference between this embodiment and embodiment 1 is:
[0067] The acidic solution used in the pickling treatment in the step (1) and the step (4) is a sulfuric acid solution with a mass concentration of 5%; the surface scrubbing treatment in the step (1) and the step (4) uses a 500-mesh nylon mill Brush for scrubbing.
[0068] The thickness of the photosensitive ink layer in the step (2) is 11um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 125°C, and the baking speed is 5m / min; The thickness of the solder resist ink layer is 28um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 105°C, and the baking speed is 5m / min.
[0069] The exposure energy scale is controlled at 8 grids when the line film exposure treatment is performed in the step (2); the exposure energy scale is controlled at 10 grids when the solder resist film exposure treatment is performed in the step (4).
[0070] The mass ...
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