Preparation method of nanowire array

Abstract

The present invention relates to a preparation method of nanowire array. The method comprises the following steps: a substrate is provided; a carbon nanotube compound structure having a plurality of micropores is provided and the carbon nanotube compound structure have a plurality of orderly arranged and cross-set carbon nanotubes and thereby forms a plurality of micropores; the carbon nanotube compound structure is arranged at one surface of the substrate; the carbon nanotube compound structure is used as a covering film to conduct dry etching on the substrate, and thereby a substrate with patterned projections is obtained; the nanotube compound structure is removed; photoresist layers are formed on the surface of the patterned projections to cover the patterned projections; the photoresist layersare removed and partial residue photoresist is formed at intersections of various raised lines of the patterned projections; and the remaining photoresist is used as a covering film to conduct dry etching on the substrate. The method is simple in process and a large area of nanowire arrays can be prepared perpendicular to the substrate.

Description

technical field [0001] The invention relates to a method for preparing a microstructure, in particular to a method for preparing a nanowire array in a large area. Background technique [0002] Nanowire arrays are widely favored in the field of nanometer research because of their excellent physical and electronic properties. However, the preparation method of the nanowire array is relatively complicated, usually involving electron beam etching or matching molecular beam epitaxy. These methods all require large-scale equipment and instruments, the process is more complicated, the time is longer, and the size is difficult to achieve nanoscale size. Furthermore, it is difficult to realize large-area preparation of nanowire arrays by the above method. Contents of the invention [0003] In view of this, it is indeed necessary to provide a method for preparing nanowire arrays with a simple process and a large area. [0004] A method for preparing a nanowire array, the method c...

AI Technical Summary

Problems solved by technology

However, the preparation method of nanowire arrays is relatively complicated, usually involving electron beam etching or coordinated molecular beam epitaxy growth, etc.

These methods all require large-scale equipment and instruments, the process is more complicated, the time is longer, and the size is difficult to achieve nanometer size.

Further, it is difficult to realize large-area preparation of nanowire arrays by using the above methods

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