Double-light-source yarn flaw detection method

A detection method and defect detection technology, which is applied in the direction of optical defect/defect detection, measuring device, and material analysis through optical means, can solve the problems of high cost, complex circuit system, and susceptibility to environmental influence, and achieve environmental impact The effect of small size and long system life
CN105675618AInactive Publication Date: 2016-06-15YIWU SCI & TECH INST CO LTD OF ZHEJIANG UNIV OF TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
YIWU SCI & TECH INST CO LTD OF ZHEJIANG UNIV OF TECH
Publication Date
2016-06-15
Estimated Expiration
Not applicable · inactive patent

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Abstract

A double light source detection method for yarn defect detection, the detection system for realizing the detection method includes a first light source detection unit and a second light source detection unit, the light colors of the first light source and the second light source are different, and the first light source detection The detection optical axes of the unit and the second light source detection unit are perpendicular to the moving direction of the yarn to be detected, while the detection optical axes of the first light source detection unit and the second light source detection unit are orthogonal; the double light source detection method includes the following steps: 1) Calculate Output voltage U of the first light source detection unit R and the second light source detection unit output voltage U G , the standard diameter set by the detection yarn is d 0 , calculate the standard voltage U0 in yarn detection; 2) Calculate the voltage output △ U of the diameter change in the horizontal direction of the yarn R and the voltage output △U of the diameter change in the vertical direction of the yarn G ;3) by ΔU R and ΔU G Determine the type of defect. The invention has low cost, simple system, and can simultaneously detect yarn thickness defects and flat defects.
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Description

technical field

[0001] The invention relates to the field of photoelectric detection of yarn quality, in particular to a detection method for yarn defect detection using a double light source mode. Background technique

[0002] Since the reform and opening up, my country's textile industry has developed rapidly, and the overall scale and output value have been greatly improved. At present, the output value of my country's textile industry has accounted for a quarter of the world's. In the textile industry, yarn defect detection has a major impact on the production quality of textiles. At present, automatic detection of yarn defects is playing an increasingly important role in production.

[0003] At present, there are many technical solutions for photoelectric detection of yarn defects. For example, Zhao Xiaodong et al. used capacitive probes to detect yarn thickness and flat defects in "Design of Capacitive Electronic Yarn Clearing System"; Jia Konghao et al. used COMS sen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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