Thin film bulk acoustic resonator and manufacturing method thereof
A thin-film bulk acoustic wave and manufacturing method technology, applied in the direction of impedance network, electrical components, etc., can solve the problems of device reliability deterioration, increase material costs, etc., and achieve the effects of improving reliability, avoiding damage, and reducing manufacturing costs
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[0028] Embodiment one of the FBAR manufacturing method of the present application comprises the following steps:
[0029] Step S301, please refer to Figure 3a , depositing a support layer 101 on the substrate 100 . The supporting layer 101 can be made of insulating materials such as silicon dioxide, silicon nitride, silicon oxynitride and the like.
[0030] Step S302, please refer to Figure 3b , etch the support layer 101 to form the cavity 104, for example, by using photolithography and etching processes. The cavity 104 is also connected with a sacrificial layer release channel (not shown) that is etched together.
[0031] Step S303, please refer to Figure 3c , depositing a sacrificial layer 105 on the substrate 100 and the supporting layer 101, and the sacrificial layer 105 fills the cavity 104 and the sacrificial layer release channel. The sacrificial layer 105 can be etched by oxygen plasma (O 2 Inorganic or organic materials removed by Plasma) process.
[0032] ...
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