Ultraviolet light mask device and use method thereof
A technology of ultraviolet light and mask, which is applied in the direction of exposure device, optics and opto-mechanical equipment of photoengraving process, can solve the problems of large light loss and low light utilization rate, and achieve the effect of reducing light loss and improving light utilization rate.
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[0029] The specific implementation of the ultraviolet light masking device provided by the embodiments of the present invention and its usage method will be described in detail below with reference to the accompanying drawings.
[0030] An ultraviolet light masking device provided by an embodiment of the present invention, such as figure 2 As shown, it includes: a light source array 100 provided with at least one ultraviolet light-emitting diode (UVLED) emitting a single central wavelength;
[0031] A mask substrate 200 disposed below the light source array 100 and having a set distance from the light source array 100, the mask substrate 200 is used to fix the mask plate 300 below the mask substrate 200; and,
[0032] The stage 400 is disposed under the mask substrate 200 and has a set distance from the mask substrate 200 . The stage 400 is used to carry the substrate 500 to be masked by the mask plate 300 .
[0033] In the above-mentioned ultraviolet light masking device pr...
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