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Ultraviolet light mask device and use method thereof

A technology of ultraviolet light and mask, which is applied in the direction of exposure device, optics and opto-mechanical equipment of photoengraving process, can solve the problems of large light loss and low light utilization rate, and achieve the effect of reducing light loss and improving light utilization rate.

Inactive Publication Date: 2016-07-13
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] In view of this, an embodiment of the present invention provides an ultraviolet light masking device and a method for using the same to solve the problem of low light utilization and light loss caused by mercury lamps and metal halide lamps used as light sources in existing ultraviolet light masking devices. big problem

Method used

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  • Ultraviolet light mask device and use method thereof
  • Ultraviolet light mask device and use method thereof
  • Ultraviolet light mask device and use method thereof

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Embodiment Construction

[0029] The specific implementation of the ultraviolet light masking device provided by the embodiments of the present invention and its usage method will be described in detail below with reference to the accompanying drawings.

[0030] An ultraviolet light masking device provided by an embodiment of the present invention, such as figure 2 As shown, it includes: a light source array 100 provided with at least one ultraviolet light-emitting diode (UVLED) emitting a single central wavelength;

[0031] A mask substrate 200 disposed below the light source array 100 and having a set distance from the light source array 100, the mask substrate 200 is used to fix the mask plate 300 below the mask substrate 200; and,

[0032] The stage 400 is disposed under the mask substrate 200 and has a set distance from the mask substrate 200 . The stage 400 is used to carry the substrate 500 to be masked by the mask plate 300 .

[0033] In the above-mentioned ultraviolet light masking device pr...

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Abstract

The invention discloses an ultraviolet light mask device and a use method thereof. A light source array formed by at least one type of ultraviolet light emitting diodes emitting light of single central wavelength is adopted as an ultraviolet light emitting light source in the ultraviolet light mask device; the ultraviolet light emitting diodes are free of harmful substance such as ozone or heavy metal mercury, so that no harmful influence can be done to human bodies or the environment. Moreover, as the ultraviolet light emitting diodes can emit light of single central wavelength, the single central wavelength of the ultraviolet light emitting diodes can be set according to specific absorption wavelength needed in a mask process so as to achieve expected chemical reaction or a process, light loss can be reduced, and the stability of the process can be ensured. In addition, the ultraviolet light emitting diodes serve as a cold light source, a relatively small amount of heat can be generated in the light emission process, and the distance between the ultraviolet light emitting diodes and a part to be radiated by the light can be shortened when being compared with that between a mercury lamp or a metal halogen lamp and the radiated part, so that the light utilization rate can be increased.

Description

technical field [0001] The invention relates to the technical field of display manufacturing, in particular to an ultraviolet light masking device and a method for using the same. Background technique [0002] Currently, in the process of manufacturing display panels, ultraviolet light is generally used in mask exposure machines, edge exposure machines, encapsulant hardeners, and optically clear resin (OCR) hardening lamp processes for touch panels. In these processes, ultraviolet light with a specific absorption wavelength is generally used. At present, mercury lamps and metal halide lamps are generally used. The ultraviolet lamps currently used will be mixed with some wavelengths that are not needed in the process for irradiation, so there is a certain amount of light loss and Will jeopardize the stability of the process. Moreover, the currently used ultraviolet lamps contain ozone (O3) and heavy metal mercury, which will cause certain harmful effects on the human body or...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/2004G03F7/70008G03F7/201G03F7/7005G03F7/7035G03F7/70216
Inventor 金宰弘赵致贤张富强
Owner BOE TECH GRP CO LTD