Ion implantation strengthening method for sealing ring
An ion implantation and ion implanter technology, applied in the direction of ion implantation plating, metal material coating process, coating, etc. The effect of reducing production cost and good economic performance
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Embodiment 1
[0020] An ion implantation strengthening method for a sealing ring, the specific steps are as follows
[0021] In the pretreatment stage, the sealing surface of the sealing ring was cleaned by ultrasonic vibration in distilled water for 5 minutes, and then taken out and air-dried.
[0022] In the ion implantation stage, put the sealing ring into the wide-beam ion implanter, use N+ as the implanted ion, the implantation capacity is 80keV, and the implantation dose is 10 14 ions / cm2, the implantation time is 0.5h, and the thickness of the final ion implantation layer on the sealing surface of the sealing ring is 200nm.
Embodiment 2
[0024] An ion implantation strengthening method for a sealing ring, the specific steps are as follows
[0025] In the pretreatment stage, the sealing surface of the sealing ring was cleaned by ultrasonic vibration in distilled water for 5 minutes, and then taken out and air-dried.
[0026] In the ion implantation stage, put the sealing ring into the wide-beam ion implanter, use N+ as the implanted ion, the implantation capacity is 300keV, and the implantation dose is 10 14 ions / cm2, the implantation time is 1h, and the thickness of the final ion-implanted layer on the sealing surface of the sealing ring is 500nm.
[0027] In the post-processing stage, the ion-implanted sealing surface was cleaned by ultrasonic vibration in distilled water for 5 minutes, and then taken out and air-dried.
Embodiment 3
[0029] An ion implantation strengthening method for a sealing ring, the specific steps are as follows
[0030] In the pretreatment stage, the sealing surface of the sealing ring was cleaned by ultrasonic vibration in distilled water for 5 minutes, and then taken out and air-dried.
[0031] In the ion implantation stage, put the sealing ring into the wide-beam ion implanter, use N+ as the implanted ion, the implantation capacity is 450keV, and the implantation dose is 10 17 ions / cm2, the injection time is 2h, and the thickness of the final ion implantation layer on the sealing surface of the sealing ring is 1 μm.
[0032] In the post-processing stage, the ion-implanted sealing surface was cleaned by ultrasonic vibration in distilled water for 5 minutes, and then taken out and air-dried.
[0033] Through this method, ions are implanted onto the surface of a large number of sealing rings at one time, and the macromolecular chains on the surface are broken to generate free radica...
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