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Single-dielectric barrier low-temperature plasma reactor

A low-temperature plasma and single-dielectric barrier technology, applied in the direction of plasma, electrical components, etc., can solve the problems of low concentration, large concentration fluctuation, and difficult treatment, and achieve the effect of improving efficiency

Inactive Publication Date: 2016-09-07
SHANGHAI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Because industrial organic waste gas has the characteristics of large air volume, low concentration, and multi-component compound pollution, and the gas air volume and organic waste gas concentration fluctuate greatly, its treatment is relatively difficult

Method used

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Embodiment Construction

[0016] The technical solution of this patent will be described in further detail below in conjunction with specific embodiments.

[0017] See Figure 1 and figure 2 , a new single-dielectric barrier low-temperature plasma reactor, including a dielectric tube 1, a dielectric tube package 2, a high-voltage pulse power supply 3, a metal mesh outer electrode 4, an inner electrode wire 5, an air inlet 6, an air outlet 7 and The inner electrode 8 of the tooth piece. Among them, the dielectric tube package 2 is used to fix and seal the two ends of the dielectric tube 1 respectively, and is connected with the inner electrode metal wire 5, the outer electrode 4 of the metal mesh is wrapped on the outer side of the dielectric tube 1, and the inner electrode 8 of the gear plate is fixed inside the equidistant The electrode metal wire 5 is located inside the medium tube 1; the air inlet 6 and the gas outlet 7 are located on both sides of the medium tube 1, and the metal mesh outer electr...

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Abstract

The invention discloses a single-dielectric barrier low-temperature plasma reactor. The single-dielectric barrier low-temperature plasma reactor comprises a dielectric tube (1), a dielectric tube encapsulation part (2), a high-voltage pulse power supply (3), a metal net outer electrode (4), an inner electrode metal line (5), an air inlet (6), an air outlet (7) and tooth slice inner electrodes (8), wherein the dielectric tube encapsulation part (2) is respectively used for fixing and sealing two ends of the dielectric tube (1), and connected with the inner electrode metal line (5); the metal net outer electrode (4) is wrapped outside the dielectric tube (1); the tooth slice inner electrodes (8) are fixed on the inner electrode metal line (5) in an equal distance, and positioned in the dielectric tube (1); the air inlet (6) and the air outlet (7) are positioned at two sides of the dielectric tube (1); and the metal net outer electrode (4) and the tooth slice inner electrodes (8) are connected onto the high-voltage pulse power supply (3). The reactor is simple in structure and convenient to operate; tooth tips of various tooth slice inner electrodes can provide steady discharge potential for dielectric barrier discharge; and the low-temperature plasma generation efficiency can be increased.

Description

technical field [0001] The invention relates to the technical field of environmental protection, in particular to a single-medium barrier low-temperature plasma reactor. Background technique [0002] Industrial organic waste gas mainly comes from petrochemical, sewage treatment, garbage disposal, chemical pharmaceutical, aerospace, electronic industry, leather processing and other production processes. Pollutants pose a serious threat to urban air quality. Because industrial organic waste gas has the characteristics of large air volume, low concentration, and multi-component compound pollution, and the gas air volume and organic waste gas concentration fluctuate greatly, its treatment is relatively difficult. Low-temperature plasma technology is considered to be one of the effective ways to deal with complex pollutants, and its basic process is to comprehensively control complex pollutants by using highly active species generated by low-temperature plasma. One of the disch...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/24
CPCH05H1/2406
Inventor 施利毅黄垒潘巧缘张登松张剑平
Owner SHANGHAI UNIV