Laser annealing equipment

Abstract

The invention provides laser annealing equipment. A lens is arranged between a laser source and a mask plate to conduct convergence on quasimolecule laser beams generated by the laser source, an equipment light path is changed, the laser source and the lens conduct synchronous and horizontal movement along the mask plate, the mask plate is scanned through the converged quasimolecule laser beams, the converged quasimolecule laser beams are transmitted to an annealing area of an array substrate through the light-transmitting area of the mask plate, and laser annealing is achieved. In the laser annealing process, the mask plate always covers the array substrate and cannot move along with the laser source and the lens, alignment precision can be improved, patterns on the substrate do not need to be tracked in real time, and thus the precision requirement of the high-PPI substrate can be met without influencing capacity; besides, according to the laser annealing equipment, an ordinary lens replaces a micro lens array, the lens can be suitable for array substrates of all models, and thus cost investment and time investment of the equipment are lowered.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a laser annealing device. Background technique [0002] At present, the laser annealing (ELA) of the LTPS (Low Temperature Poly-silicon, low temperature polysilicon technology) production line is to perform laser annealing on the a-Si on the entire glass substrate after the deposition of a-Si (amorphous silicon). After ELA, all a-Si on the surface of the glass substrate is converted to p-Si (polysilicon), in order to ensure the source (S), drain (D) and p-Si ohmic contact, SD Doping (doping) process is required , and the doping process requires the purchase of expensive doping equipment and the transformation of special gas pipelines, etc., which requires a large investment in equipment. In addition, the LTPS process is complex and it is difficult to ensure large-area uniformity, and it is difficult to achieve large-scale product production. Therefore, the latest MLA (microlens...

AI Technical Summary

Problems solved by technology

[0008] The present invention aims at the above-mentioned deficiencies in the prior art, and provides a laser annealing equipment, which is used to at least partially solve the problems of low alignment accuracy, low production capacity, high manufacturing cost and long cycle time of the existing MLA annealing equipment

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