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A kind of preparation technology of nano seal

A preparation process and nano-seal technology, applied in the field of micromachining, can solve the problems of unsatisfactory products, slow removal rate, sample damage, etc., and achieve good smoothness, good lubricity and anti-toughness performance, and the effect of good control of rotation speed.

Active Publication Date: 2019-05-03
宣城良知知识产权服务有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Traditional electron beam processing nanoimprint stamps, the removal rate is slow during etching, the sample will be damaged to a certain extent, and the yield is low, and the prepared products are not ideal

Method used

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Embodiment Construction

[0011] In order to deepen the understanding of the present invention, we will further describe the present invention below. The following examples are only used to explain the present invention, and do not constitute a limitation to the protection scope of the present invention.

[0012] A preparation process of nano-seal, characterized in that: comprising the following steps:

[0013] (1) Surface treatment of the mother board: put the mother board in acetone, vibrate for 4-6min in the ultrasonic tank, take out the mother board, put it in ethanol, vibrate the mother board for 4-6 minutes in the ultrasonic tank, and then shake the mother board for 4-6 minutes. Take it out, put it into deionized water at last, vibrate it in the ultrasonic tank for 2-4 minutes, and take out the motherboard;

[0014] (2) Preparation of the polydimethylsiloxane composite sheet on the mother board: brush the release agent on the mother board, after the release agent is formed into a film, the polydi...

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Abstract

The invention discloses a preparation technique of a nano stamp. The preparation technique comprises the following steps that (1) surface treatment is conducted on a mother board; (2) polydimethylsiloxane compound sheets is prepared on the mother board; and (3) the polydimethylsiloxane compound sheets are demolded. The preparation technique has the advantages that the technique is simple, the efficiency is high, and high-fidelity replication of patterns on the mother board can be achieved.

Description

technical field [0001] The invention relates to the field of micro-processing, in particular to a preparation process of a nano-seal. Background technique [0002] The traditional electron beam processing nanoimprint stamp has a slow removal rate during etching, and the sample will be damaged to a certain extent. At the same time, the yield is low, and the prepared product is not ideal. SUMMARY OF THE INVENTION [0003] Purpose of the invention: The purpose of the present invention is to solve the deficiencies in the prior art, and provide a preparation process of a nano-seal, which has the advantages of simple process, high efficiency, and high-fidelity reproduction of the pattern on the motherboard. [0004] Technical solution: a preparation process of a nano-seal, comprising the following steps: [0005] (1) Surface treatment of the mother board: put the mother board in acetone, vibrate for 4-6min in the ultrasonic tank, take out the mother board, put it in ethanol, vi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B41C1/00
CPCB41C1/00
Inventor 王晶
Owner 宣城良知知识产权服务有限公司
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