A light-emitting diode chip and its preparation method
A technology of light-emitting diodes and LED chips, which is applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of low light output efficiency of LEDs, and achieve the effect of improving light output efficiency and avoiding loss
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Embodiment 1
[0040] An embodiment of the present invention provides an LED chip, see figure 1 The LED chip includes a substrate 1, and an N-type layer 2, a light-emitting layer 3, and a P-type layer 4 sequentially laminated on the first surface of the substrate 1, and the P-type layer 4 is provided with a recess extending to the N-type layer 2. Groove 100, on the P-type layer 4, a current blocking layer 5, a transparent conductive layer 6, a P-type electrode 7 are stacked in sequence, an N-type electrode 8 is arranged on the N-type layer 2, the side walls of the N-type layer 2, the groove 100 and The transparent conductive layer 6 is covered with a passivation layer 9 , the second surface of the substrate 1 is provided with a reflective layer 10 , and the second surface of the substrate 1 is the surface opposite to the first surface of the substrate 1 .
[0041] In this embodiment, the angle between the side surface of the LED chip and the bottom surface of the LED chip is greater than 90°...
Embodiment 2
[0054] The embodiment of the present invention provides a kind of preparation method of LED chip, see image 3 , the method includes:
[0055] Step 201: growing an N-type layer, a light-emitting layer, and a P-type layer sequentially on the first surface of the substrate.
[0056] In this embodiment, the substrate can be a sapphire substrate, a silicon substrate or a silicon carbide substrate, the N-type layer is an N-type GaN layer, the light-emitting layer includes alternately stacked InGaN layers and GaN layers, and the P-type layer is a P-type GaN layer. GaN layer.
[0057] Specifically, this step 201 may include:
[0058] An N-type layer, a light-emitting layer, and a P-type layer are sequentially grown on the substrate by using Metal-organic Chemical Vapor Deposition (MOCVD) equipment.
[0059] Optionally, after step 201, the preparation method may further include:
[0060] The surface of the epitaxial wafer formed by the N-type layer, the light-emitting layer and th...
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