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303results about How to "Increase light emitting area" patented technology

Manufacture method of array type high-voltage LED device

The invention discloses a manufacture method of an array type high-voltage LED device, which comprises the steps of: manufacturing a mask on a P type gallium nitride layer with an epitaxial structure, selectively etching the epitaxial structure to form an N type step structure; manufacturing a mask on the surface of an N type gallium nitride layer with an epitaxial structure, forming isolated deep trench; carrying out high-temperature sulfur phosphoric acid corrosion; depositing an insulation dielectric layer on the surface of the etched epitaxial structure; corroding the insulation dielectric layer outside the side wall of the deep trench; manufacturing a transparent conductive layer between adjacent N type step structures; partially corroding the transparent conductive layer on the surface of the P type gallium nitride layer on the N type step structure on the outermost side; and manufacturing a P metal electrode and an N metal electrode on the transparent conductive layer. According to the invention, electrode light absorption can be reduced, the light outlet area on the epitaxial side surface and the bottom of the chip is increased, the manufacture method is mutually matched with a post process, and thus the light emitting efficiency of a high-voltage LED chip can be increased.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI

Semiconductor laser and manufacturing method thereof

InactiveCN105161976AGuaranteed to workHigh beam quality of the output light is guaranteed while workingLaser detailsLaser active region structureGratingOptical limiting
The invention discloses a single-mode high-power high-brightness GaSb-based bragg reflection master oscillator power amplifier (MOPA) integrated semiconductor laser and a manufacturing method thereof. The bragg reflection MOPA integrated semiconductor device comprises a substrate, an epitaxy structure, a gain amplification region, a master oscillator region, a bragg reflection region and optical limiting grooves, wherein the epitaxy structure grows on the substrate and comprises an N-type lower contact layer, an N-type lower limiting layer, a lower waveguide layer, an active region, an upper waveguide region, a P-type upper limiting layer and a P-type upper contact layer from bottom to top; the gain amplification region is located on the front part, namely a light outlet part, of the semiconductor laser, and is in a conical structure which is formed by etching the P-type upper contact layer downwards; the master oscillator region is located at the rear part of the gain amplification region and is in a ridge waveguide structure which is formed by etching the P-type upper limiting layer downwards; the bragg reflection region is located at the rear part of the master oscillator region and is in a periodical bragg grating structure which is formed by etching the P-type upper limiting layer downwards; and the optical limiting grooves are symmetrically distributed in two sides of the ridge waveguide and are obliquely arranged together with the ridge waveguide.
Owner:INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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