Display panel, display device, array substrate and manufacturing method thereof

Abstract

The invention discloses a display panel, a display device, an array substrate and a manufacturing method of the array substrate. The manufacturing method of the array substrate comprises the steps of providing a first substrate, wherein a pixel driving membrane layer and a flat layer which is located on the pixel driving membrane layer and deviates from the surface of the first substrate are arranged on the surface of the first substrate; thinning the flat layer so as to form a groove; forming a conducting layer and a passivation layer in sequence on one side, which deviates from the first substrate, of the flat layer; etching an area, corresponding to the groove, of the passivation layer, so as to form a through hole which penetrates through the passivation layer and other flat layers; forming a pixel electrode layer, which passes through the groove and the through hole and is connected with the pixel driving membrane layer, on the surface of one side, which deviates from the first substrate, of the passivation layer. According to the manufacturing method of the array substrate, the problems of complete removal of the passivation layer, vertical etching of the flat layer, poor coating uniformity of photoresist and waste of the photoresist, which possibly occur in the simultaneous etching process of the flat layer and the passivation layer, are avoided.

Description

technical field [0001] The present application relates to the technical field of display panel preparation, and more specifically, to a display panel, a display device, an array substrate and a manufacturing method thereof. Background technique [0002] With the continuous development of display technology, the application of display panels is becoming more and more extensive. As an important part of the display panel, the quality of the array substrate determines the display effect of the display panel to a large extent. It determines the aperture ratio of the display panel, and also determines the contact resistance between the pixel electrode of the display panel and the drain of the thin film transistor. [0003] In order to increase the aperture ratio of the display panel and reduce the contact resistance between the pixel electrode and the drain of the thin film transistor, in the prior art, the flat layer and the passivation layer are usually etched simultaneously to...

AI Technical Summary

Problems solved by technology

[0004] In order to solve the above-mentioned technical problems, the present invention provides a display panel, a display device, an array substrate and a manufacturing method thereof, to solve the problems caused by the flat layer and the passivation layer due to the large thickness of the flat layer of the array substrate. At the same time, the passivation layer is completely removed during the etching process, the flat layer is vertically etched, the coating uniformity of the photoresist is poor, and the photoresist is wasted.

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