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Mask cleaning device

A technology for cleaning devices and masks, which is applied in the photolithographic process exposure device, the photographic process of pattern surface, optics, etc. It can solve the problem of small space, inability to remove dust or particles, and influence on the accuracy of mask exposure patterns, etc. question

Active Publication Date: 2017-01-04
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Due to the small space between the lower surface of the mask 01 and the support plate 02, the air gun cannot remove the dust or particles deposited on the support plate 02. When the mask 01 is taken in the confined space in the exposure machine, it may cause deposition The dust or particles on the support plate 02 are driven by the airflow and fall on the mask plate 01, thus affecting the accuracy of the mask exposure pattern of the substrate to be processed

Method used

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Embodiment Construction

[0035] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0036] An embodiment of the present invention provides a mask cleaning device, such as figure 2 As shown, it is used to clean the mask plate 01 to be cleaned and the support plate 02 on which the mask plate 01 is placed, including the first panel 11 and the second panel 12 arranged oppositely, between the first panel 11 and the second panel 12 With a gap a, before using the mask plate cleaning device of the present invention to clean the mask plate 01 to be c...

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Abstract

The embodiment of the invention provides a mask cleaning device, and relates to the technical field of mask maintenance. By the mask cleaning device, dust or other small particles on a mask and a support plate can be removed. The mask cleaning device is used for cleaning a mask to be cleaned and a support plate used for placing the mask to be cleaned and comprises a first panel and a second panel, wherein the first panel and the second panel are arranged opposite to each other, a gap is formed between the first panel and the second panel and is used for placing the mask to be cleaned between the first panel and the second panel, the second panel is arranged between the mask to be cleaned and the support plate for cleaning operation, a plurality of air outlets are formed in one side, near to the second panel, of the first panel, a plurality of air outlets are formed at least in one side, deviating from the first panel, of the second panel, and an air source connected with the air outlets is further arranged on the mask cleaning device.

Description

technical field [0001] The invention relates to the technical field of mask plate maintenance, in particular to a mask plate cleaning device. Background technique [0002] TFT-LCD (Thin Film Transistor Liquid Crystal Display, Thin Film Transistor Liquid Crystal Display), as a flat panel display device, has become more and more popular due to its small size, low power consumption, no radiation and relatively low production cost. It is widely used in the field of high-performance display. [0003] Thin-film transistor-liquid crystal display is composed of array substrate and color filter substrate pair box. In the process of the array substrate and the color filter substrate, for example, the source and drain of the TFT need to be realized through patterning processes such as exposure and etching. The film layer to be processed on the substrate under the mask plate is etched and exposed to form a specific pattern on the substrate. [0004] The mask has a composition pattern...

Claims

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Application Information

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IPC IPC(8): G03F1/82G03F7/20
Inventor 岳浩张玉虎王军帽聂彬
Owner BOE TECH GRP CO LTD
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