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Device and method for pinhole alignment of point diffraction interferometer

A point-diffraction interferometer and pinhole technology, which is applied in the field of devices for point-diffraction interferometer pinhole alignment, can solve the problems of long time-consuming and high cost for precise alignment of the point-diffraction interferometer pinhole, and achieves short time-consuming, high precision effect

Active Publication Date: 2017-01-18
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] In order to solve the time-consuming and high-cost problems of precise alignment of the pinholes of point diffraction interferometers, the present invention provides a device and method for pinhole alignment of point diffraction interferometers

Method used

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  • Device and method for pinhole alignment of point diffraction interferometer
  • Device and method for pinhole alignment of point diffraction interferometer

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Experimental program
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Effect test

Embodiment 1

[0048] Such as figure 1 Shown is a schematic structural diagram of the pinhole alignment device used in the point-diffraction interferometer in Embodiment 1. The device includes a first laser 1, a laser beam expander 2, a first dichroic prism 3, a half-wave plate 4, a second dichroic prism 5, a quarter-wave plate 6, a focusing mirror 7, and a pinhole plate 8 , a three-dimensional adjustment mechanism 9, a second laser 10, a second laser power meter 11, a first laser power meter 12, a rear group lens 13 for imaging, a CMOS camera 14, and a computer 15.

[0049] In this embodiment, the working principle of the pinhole alignment device for the point diffraction interferometer is as follows:

[0050] The first laser 1 is used to emit linearly polarized laser light. The laser beam expander 2 expands and collimates the linearly polarized laser light. The splitting ratio of the first dichroic prism 3 makes most of the laser light transmit and a small part of the laser light is refle...

Embodiment 2

[0061] This embodiment provides a method for realizing pinhole micron level coarse alignment:

[0062] S1.1, first turn on the second laser 10, the laser beam directly illuminates and passes through the pinhole on the pinhole plate 8, at this time, the illumination spot is large, and the pinhole can be easily illuminated, and the laser beam passes through the focusing mirror 7, four Arrive at the CMOS camera 14 after the one-third wave plate 6, the second dichroic prism 5 and the rear group lens 13 for imaging, observe the first light spot O1 that can be seen on the CMOS camera 14, and record the position of the light spot O1 as P1;

[0063] S1.2. Turn on the first laser 1, and the emitted laser light passes through the laser beam expander 2, the first dichroic prism 3, the half-wave plate 4, the second dichroic prism 5, the quarter-wave plate 6 and the focusing The mirror 7 converges and illuminates on the pinhole plate 8, and the light beam reflected by the pinhole plate 8 ...

Embodiment 3

[0066] Such as figure 2 As shown, the flow chart for realizing pinhole precision alignment provided by this embodiment:

[0067] S2.1. Turn off the second laser 10, place the second laser power meter 11 behind the pinhole plate 8, and detect the power of the pinhole diffracted light;

[0068] S2.2. Set the scanning range of the three-dimensional adjustment mechanism 9 to be 10 μm×10 μm, the scanning resolution to be 1 μm, and the total number of scanning points to be 100;

[0069] S2.3. Control the three-dimensional adjustment mechanism 9 to scan one step in a two-dimensional plane of 10 μm×10 μm;

[0070] S2.4. Record the measured values ​​and ratios of the second laser power meter 11 and the first laser power meter 12 for each scanning step;

[0071] S2.5. Determine whether the scanning of the three-dimensional adjustment mechanism 9 is completed. If not, repeat steps 2.3-2.4. If it is completed, proceed to the next step 2.6. Steps 2.3-2.4 need to be repeated 100 times th...

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Abstract

The invention provides a device for pinhole alignment of a point diffraction interferometer. The device comprises a first laser device, laser beam expanders, a first beam splitting prism, a half-wave plate, a second beam splitting prism, a quarter-wave plate, a focusing mirror, a pinhole plate, a three-dimensional adjusting mechanism, a second laser device, a second laser power meter, a first laser power meter, a rear group of lenses for imaging, a CMOS camera and a computer. The invention further provides a method for pinhole alignment of the point diffraction interferometer. The method comprises the steps of rapid coarse alignment and precise alignment, the coarse alignment process is intuitive, convenient and rapid, the precise alignment process can achieve0.1 mu m precision alignment by just two rounds of scanning, and the method has the advantages of short time consumption and high precision.

Description

[0001] 【Technical field】 [0002] The invention belongs to the technical field of optical precision adjustment, and in particular relates to a device and method for pinhole alignment of a point diffraction interferometer. [0003] 【Background technique】 [0004] In order to improve the resolution and critical dimension of the projection lithography objective lens, the wave aberration of the optical system tends to reach the diffraction limit more and more. Extreme ultraviolet lithography works in the extreme ultraviolet band with a wavelength of 13-14nm, requiring the wave aberration of the optical system to be less than 1nmRMS, and the EUVL projection objective lens has extremely strict wave aberration requirements. For the surface deviation of a single mirror It needs to reach 0.25nmRMS, which puts forward unprecedented requirements for optical processing and inspection, that is, the processing of EUVL projection objective optical elements requires the detection accuracy of o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/24G01B9/02
CPCG01B9/02015G01B11/2441
Inventor 于杰张海涛马冬梅金春水
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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