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Semiconductor device having edge cell of internal pressure stabilization structure

A technology for power semiconductors and devices, which is applied in the field of power semiconductor devices and can solve problems such as the increase in the size of semiconductor chips

Inactive Publication Date: 2017-02-22
美普森半导体公司(股)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] As the operating voltage of power semiconductor devices becomes progressively higher, the physical size of the electric field mitigation structures used to extend the longitudinal boundary of the active cell also increases at higher operating voltages, which may lead to an increase in the size of the semiconductor chip

Method used

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  • Semiconductor device having edge cell of internal pressure stabilization structure
  • Semiconductor device having edge cell of internal pressure stabilization structure
  • Semiconductor device having edge cell of internal pressure stabilization structure

Examples

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Embodiment Construction

[0047] Since various modifications and embodiments of the present invention are possible, specific embodiments will be illustrated and described with reference to the accompanying drawings.

[0048] However, this is not intended to limit the present invention to specific embodiments, but should be understood to include all modifications, equivalents and replacements covered within the technical idea and technical scope of the present invention.

[0049] Throughout the description of the present invention, when it is determined that the description of some related conventional techniques would deviate from the gist of the present invention, the detailed description thereof will be omitted.

[0050] In the drawings, any part irrelevant to the description of the present invention is omitted, and like reference signs will be given to like parts throughout the specification.

[0051] figure 1 A structure of a power semiconductor device of an edge cell having a stable voltage-resis...

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PUM

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Abstract

According to an embodiment of the present invention, in a power semiconductor device comprising an active battery and an edge cell formed adjacent to the active battery for stabilizing the electric field,the active battery comprising: an N + substrate formed on an upper side of the second electrode; an N-drift layer formed on the upper side of the N + substrate; a P-base region formed on an upper portion of the N-drift layer; and a first electrode formed on an upper side of the P-base region for receiving a signal; the edge battery comprising: a field plate extending from the first electrode as a conductor; a buffer ring formed underneath the field plate by injecting the first impurity ions above the N-Drift layer extending from the active battery; a plurality of field loops having a predetermined horizontal gap and width from the buffer ring formed by injecting the first impurity ions over the N-drift layer; and a field effect oxide film formed between the field plate and the buffer ring and covering a plurality of field loops.

Description

technical field [0001] The present invention relates to a power semiconductor device, and more particularly, to an edge cell technology having a stable voltage-resistant structure in a semiconductor device that withstands a high voltage of 1,700V. Background technique [0002] Power semiconductor devices are used to convert or control power. [0003] Most power semiconductor devices withstand higher voltages and have higher currents and higher frequencies than typical semiconductor devices. Generally, power semiconductor devices included in power devices and used for power semiconductors are rectifier diodes, power MOSFETs, insulated gate bipolar transistors (IGBTs), thyristors (thyristors), gate turn-off (GTO) thyristors, and bidirectional SCR (triac). [0004] Among the many characteristics of power semiconductor devices, it is important to maintain a high breakdown voltage. [0005] When the concentration of the drift (drift) region in the power semiconductor device de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/40
CPCH01L29/404H01L29/407
Inventor 郑垠植金禹泽杨昌宪朴兌洙金成洙朴镕浦
Owner 美普森半导体公司(股)
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