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Application of bimodal anti-counterfeiting pattern from one-dimensional shuttle silicon nanomaterial in digital encryption

A silicon nano, dual-modal technology, applied in the field of anti-counterfeiting, can solve the problems of difficult to achieve anti-counterfeiting effect, poor fluorescence stability, single fluorescence color, etc., and achieve good excitation wavelength dependence, good magnetic anti-counterfeiting effect, quantum production. high rate effect

Inactive Publication Date: 2017-03-22
SUZHOU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, traditional fluorescent materials used for anti-counterfeiting usually exhibit a single fluorescent color, poor fluorescence stability, and low quantum efficiency, making it difficult to achieve good anti-counterfeiting effects

Method used

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  • Application of bimodal anti-counterfeiting pattern from one-dimensional shuttle silicon nanomaterial in digital encryption
  • Application of bimodal anti-counterfeiting pattern from one-dimensional shuttle silicon nanomaterial in digital encryption
  • Application of bimodal anti-counterfeiting pattern from one-dimensional shuttle silicon nanomaterial in digital encryption

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] (1) Preparation of one-dimensional fusiform silicon nanomaterials

[0030] Add 3ml of aminopropyltrimethoxysilane to 25ml of a nitrogen-protected solution in which 0.5g of trisodium citrate dihydrate is dissolved, then add 1ml of 0.1M ferric chloride solution, and fully stir overnight.

[0031] The reaction precursor solution is placed in a microwave reactor, and the control conditions are as follows:

[0032] Microwave power: 100W; Reaction temperature: 150°C; Reaction time: 15min.

[0033] The material obtained from the reaction was dialyzed to neutral in deionized water to obtain the final product.

[0034] (2) Dual-mode anti-counterfeiting application

[0035] The prepared one-dimensional shuttle-shaped fluorescent silicon nanomaterials, silicon nanoparticles and R6G were injected into the printer cartridge respectively, and the digital pattern designed in advance was printed on the computer to obtain a digital pattern with anti-counterfeiting function. Under exc...

Embodiment 2

[0037] (1) Preparation of one-dimensional fusiform silicon nanomaterials

[0038] Add 3ml of aminopropyltrimethoxysilane to 25ml of a nitrogen-protected solution dissolved in 3.5g of trisodium citrate dihydrate, then add 0.8ml of 0.1M ferric nitrate solution, and stir overnight.

[0039] The reaction precursor solution is placed in a microwave reactor, and the control conditions are as follows:

[0040] Microwave power: 100W; Reaction temperature: 150°C; Reaction time: 15min.

[0041] The material obtained from the reaction was dialyzed to neutral in deionized water to obtain the final product.

[0042] (2) Dual-mode anti-counterfeiting application

[0043] First print the designed digital pattern on the computer, and write the prepared one-dimensional fusiform fluorescent silicon nanomaterials, silicon nanoparticles and R6G respectively on the specific area of ​​the digital pattern, and get the anti-counterfeiting function after fully drying. The digital pattern shows diff...

Embodiment 3

[0045] (1) Preparation of one-dimensional fusiform silicon nanomaterials

[0046] Add 3ml of aminopropyltrimethoxysilane to 25ml of citric acid solution dissolved in 0.6g of citric acid protected by nitrogen, then add 1ml of 0.1M ferric chloride solution, and stir thoroughly overnight.

[0047] The reaction precursor solution is placed in a microwave reactor, and the control conditions are as follows:

[0048] Microwave power: 100W; Reaction temperature: 150°C; Reaction time: 15min.

[0049] The material obtained from the reaction was dialyzed to neutral in deionized water to obtain the final product.

[0050] (2) Dual-mode anti-counterfeiting application

[0051] A stamp with a specific digital pattern is obtained by photolithography, and the prepared one-dimensional fusiform fluorescent silicon nanomaterials, silicon nanoparticles and R6G are respectively applied to the specific area of ​​the digital pattern, and the digital with anti-counterfeiting function is obtained af...

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Abstract

The invention relates to application of a bimodal anti-counterfeiting pattern from one-dimensional shuttle silicon nanomaterial in digital encryption; the application is simple and causes low in toxicity. The one-dimensional shuttle silicon nanomaterial has good fluorescent properties, high quantum yield and good photo-stability. Compared with traditional fluorescent silicon nanomaterials or fluorescent materials, the one-dimensional shuttle silicon nanomaterial has good excitation wavelength dependence. An anti-counterfeiting digital pattern formed by means of inkjet printing or coating with the one-dimensional shuttle silicon nanomaterial as fluorescent ink provides good anti-counterfeiting effect. Meanwhile, compared with present commercialized one-dimensional shuttle silicon nanomaterial from magnetic resonance imaging contrast agents, the one-dimensional shuttle silicon nanomaterial of the invention may provide weighted imaging of nuclear magnetic resonances T1 and T2 at the same time. Based on its unique magnetic properties, the prepared anti-counterfeiting pattern may exhibit different digital patterns through weighted imaging of nuclear magnetic resonances T1 and T2, so that good magnetic anti-counterfeiting effect is achieved.

Description

technical field [0001] The invention relates to the field of anti-counterfeiting technology, in particular to the application of a dual-mode anti-counterfeiting pattern prepared by a one-dimensional shuttle-shaped silicon nanometer material in digital encryption. Background technique [0002] In recent years, the increasingly rampant counterfeit and shoddy goods have attracted great attention from all countries in the world. The research on anti-counterfeiting technology, materials and products has become a topic that researchers generally pay attention to, and it is also an important means for manufacturers, merchants and consumers to protect their own interests. Currently researched and widely used anti-counterfeiting technologies mainly include physical anti-counterfeiting technology, chemical anti-counterfeiting technology, biological anti-counterfeiting technology and multidisciplinary anti-counterfeiting technology. Among them, chemical anti-counterfeiting technology ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D11/50C09D11/03B41M3/14C09K11/60
CPCC09D11/50B41M3/144C09D11/03C09K11/607
Inventor 何耀宋斌钟旖菱
Owner SUZHOU UNIV