Super-resolution photoetching equipment based on chirp grating gap detection and control
A chirped grating and super-resolution technology, applied in the field of super-resolution lithography, can solve the problems of mask substrate limitation and influence, etc.
Active Publication Date: 2017-03-29
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology
Capacitive sensors are the most commonly used gap detection detectors. Usually, electrodes are embedded in the mask and the surface of the substrate to form parallel plate capacitance. Although the structure is simple and easy to implement, the mask substrate is limited and will be affected during the exposure process. Drift effect is also obvious
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[0068] In order to make the purpose, technical solution and advantages of the device of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0069] refer to figure 1 , the device is mainly composed of an ultra-precision environmental control system 1, an active vibration isolation platform 2, a support frame 3, a light source 4, a gap detection system 5, an alignment module 6, a lithography lens module 7, a film holder module 8 and a control system 9 It consists of nine parts. Among them, the ultra-precision environmental control system 1 provides the entire super-resolution lithography device with a good lithography environment with a temperature of 22±0.1°, a humidity of 55±5%, and a cleanliness of 100; the active vibration isolation platform 2 ensures platform gap detection, The stability of alignment and super-resolution lithography functions; the support frame 3 is a marble structu...
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The invention discloses super-resolution photoetching equipment based on chirp grating gap detection and control, and belongs to the technical field of improvements and innovations of super-resolution photoetching equipment. The equipment is characterized by comprising an ultraprecise environment control system, an active vibration isolation platform, a supporting framework, a light source, a gap detection system, an alignment module, a photoetching lens module, a bearing table module and a control system. The equipment realizes nano-level online gap detection and control through a chirp grating diffractive imaging technology; clearance exposure is realized, and a super-resolution photoetching instrument is effectively protected; and by a laser interferer, a precise displacement table, a nano displacement table, the alignment module and a gap detection module for feedback control, ultraprecise alignment and stepping photoetching functions are realized.
Description
technical field [0001] The invention is a super-resolution photolithography device based on chirped grating gap detection and control, and belongs to the technical field of improvement and innovation of the super-resolution photolithography device. Background technique [0002] With the rapid development of the IC industry, the miniaturization of electronic product integrated circuits and the increasing storage density, there is an urgent need to improve the photolithography process. The resolution and exposure efficiency of the photolithography process determine the resolution and production efficiency of the production of integrated circuit chips. The photolithography process is to transfer the pattern on the mask to the photoresist coated on the surface of the silicon wafer through exposure, and then transfer the pattern to the silicon wafer through development, etching and other processes. Due to the effects of diffraction and interference produced by optical fluctuatio...
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Login to View More IPC IPC(8): G03F7/20
CPCG03F7/7085
Inventor 罗先刚王彦钦马晓亮赵泽宇高平李雄
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI