Preparation method for semiconductor electrothermal film
A semiconductor and electrothermal film technology, applied in electrothermal devices, ohmic resistance heating, electrical components, etc., can solve problems such as excessive temperature requirements and heavy metal pollution, and achieve the effect of overcoming excessive temperature requirements, protecting equipment, and working stably
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[0010] A preparation method for a semiconductor electrothermal film, comprising the following steps:
[0011] 1. Raw material preparation Add metal compounds, such as gold, silver, tin ----- or other organic compounds into 1%-10% by weight compounds, such as antimony, iron, fluorine as dopants;
[0012] 2. Material blending Mix the above-mentioned raw materials with 20%-60% medium materials, such as water, methanol, hydrochloric acid, ethanol, ethylamine, triethylamine;
[0013] 3. Substrate cleaning: The preformed component substrates that can be heated, such as quartz, glass, ceramics, and mica, are made of high-temperature-resistant and low-expansion materials, and the surface is cleaned with purified soft water and dried;
[0014] 4. High-temperature atomization growth Put the above-mentioned substrate into a high-temperature furnace to heat to activate its surface, and then atomize and spray the above-mentioned prepared fluid material into the high-temperature furnace to ...
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