High-temperature and large-range silicon-sapphire pressure sensor structure

A pressure sensor, sapphire technology, applied in the direction of measuring force, instruments, measuring devices, etc., can solve the problems of large measurement range, small measurement range, low sensitivity, etc., and achieve the effect of avoiding p-n isolation and improving the working temperature range

Active Publication Date: 2017-05-10
BEIHANG UNIV +1
View PDF7 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, the alloy thin-film pressure sensor uses thin-film deposition to replace the bonding of traditional adhesive strain gauges, and realizes pressure measurement at high temperatures. Many inconveniences; SOI pressure sensors are limited by the process and structure, and the application range is limited; SiC pressure sensors are very difficult to prepare single crystal and thin film materials and device manufacturing, and there is still a big gap between the research level and the actual application requirements ; Silicon-sapphire pressure sensor has become a hot research technology due to its good mechanical properties and high temperature resistance
[0004] The structure of the piezoresistive pressure sensor is mainly divided into two types: single diaphragm and double diaphragm. The single diaphragm structure is used for small-range pressure measurement with high sensitivity, but the measurement range is small; the double-diaphragm structure is used for large-range pressure measurement. pressure measurement, the measurement range is large, but the sensitivity is low

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-temperature and large-range silicon-sapphire pressure sensor structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The structure of the high-temperature and large-range silicon-sapphire pressure sensor of the present invention will be further described below in conjunction with the accompanying drawings.

[0018] Silicon-sapphire pressure sensor structure of the present invention such as figure 1 As shown, it mainly includes a titanium alloy shell 1, a lower titanium alloy diaphragm 2, a sapphire diaphragm 3, a single crystal silicon strain resistance 4, an upper titanium alloy diaphragm 5, a connecting cylinder 6 and a metal lead 7. Among them, the titanium alloy shell 1 provides support and protection for other components, and the lower titanium alloy diaphragm 2 and the sapphire diaphragm 3 are combined by vacuum sintering to form an elastic sensitive diaphragm; the sapphire diaphragm 3 is used as the substrate, and the On it, the single crystal silicon strain resistance 4 is processed by semiconductor technology to form a silicon-sapphire structure; the single crystal silicon st...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a high-temperature and large-range silicon-sapphire pressure sensor structure, which comprises a titanium alloy shell, two titanium alloy diaphragms, a connecting cylinder, a sapphire diaphragm, a monocrystalline silicon strain resistor and a metal wire. One titanium alloy diaphragm is combined with the sapphire diaphragm through vacuum sintering so as to form a sensitive element of a pressure sensor. A layer of monocrystalline silicon thin film with the thickness thereof to be 0.1-0.5 mum grows on the sapphire diaphragm in the heteroepitaxial manner. On an epitaxial film, the monocrystalline silicon strain resistor is prepared through the semiconductor plane process. The resistor forms a wheatstone bridge. The lower part of the other titanium alloy diaphragm is connected to a cylinder and the lower surface of the cylinder is provided with a spherical concave surface. The spherical concave surface completely fit the sapphire diaphragm during the deforming process. Meanwhile, the spherical concave surface is kept at a spacing of 5-10 mum from the sapphire diaphragm when there is no load. According to the technical scheme of the invention, upper and lower diaphragms form a separation type double-diaphragm structure. During the measurement process of a small-range pressure, the advantage of high sensitivity is realized. Meanwhile, the structure can be used for the measurement of large-range pressures.

Description

technical field [0001] The invention belongs to the technical field of sensor optimization design in advanced sensor technology research, and specifically relates to a high-temperature and large-range silicon-sapphire pressure sensor structure. Background technique [0002] The high-precision measurement technology of pressure under high temperature and high pressure environment has a very broad application prospect in the fields of industry, aviation, aerospace, weaponry and other fields. At the same time, due to the limitation of the temperature characteristics of sensitive materials, this technology has always been a difficult problem to be overcome in the field of pressure measurement. [0003] At present, high-temperature pressure sensors developed at home and abroad include alloy film pressure sensors, silicon-on-insulator (SOI) pressure sensors, SiC pressure sensors, silicon-sapphire pressure sensors, etc. Among them, the alloy thin-film pressure sensor uses thin-fil...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01L1/22
CPCG01L1/22
Inventor 郭占社卢超黄漫国李欣
Owner BEIHANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products