Method for making and using a test sample for measuring the length of a lightly doped drain region
A technology of lightly doped drain region and test sample, applied in semiconductor/solid-state device testing/measurement, semiconductor/solid-state device manufacturing, semiconductor device, etc., can solve the problem of inability to product characterization and measurement, and inability to effectively monitor LDD doping process , LDD deviation and other issues to achieve the effect of improving stability and reliability
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[0050] In order to further illustrate the technical means adopted by the present invention and its effects, a detailed description is given below in conjunction with the preferred embodiments of the present invention and the accompanying drawings.
[0051] see figure 2 , the present invention first provides a method for making a test sample for measuring the length of a lightly doped drain region, including the following steps:
[0052] Step S1, such as image 3 As shown, a base substrate 1 is provided on which a cover buffer layer 2 is deposited.
[0053]The base substrate 1 is preferably a glass substrate; the material of the buffer layer 2 is silicon nitride (SiNx), silicon oxide (SiOx), or a combination of the two.
[0054] Step S2, such as Figure 4 As shown, an amorphous silicon layer is deposited on the buffer layer 2, the amorphous silicon layer is crystallized to obtain a polysilicon layer 3', and the polysilicon layer 3' is patterned.
[0055] In this step S2, t...
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