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Composition for thinning technology pretreatment of TFT (thin film transistor) glass substrate

A technology of glass substrate and composition, which is applied in the field of composition for etching pretreatment of TFT glass substrate, can solve problems such as difficult disposal of waste liquid, achieve the effect of reducing pits, improving treatment effect, and reducing the time of regrinding process

Inactive Publication Date: 2017-05-31
天津美泰真空技术有限公司
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Problems solved by technology

Although this method can achieve a certain effect of reducing the pits of the thinned glass substrate, a large amount of concentrated sulfuric acid is added to the pretreatment mixed acid, and the waste liquid generated after the pretreatment process is difficult to process.

Method used

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  • Composition for thinning technology pretreatment of TFT (thin film transistor) glass substrate
  • Composition for thinning technology pretreatment of TFT (thin film transistor) glass substrate
  • Composition for thinning technology pretreatment of TFT (thin film transistor) glass substrate

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Embodiment Construction

[0011] The composition provided by the invention for the pretreatment of TFT glass substrate thinning process is prepared in the following way,

[0012] 1) Mix the prescribed amount of hydrochloric acid and hydrofluoric acid, and add appropriate amount of water to dilute

[0013] 2) Dissolve the sodium carboxymethylcellulose and polyvinylpyrrolidone K90 of the prescribed amount in an appropriate amount of water until completely dissolved;

[0014] 3) Slowly add the mixed solution obtained in step 1) to the mixed solution in step 2), add the prescribed amount of ethanol and make up the prescribed amount of water.

[0015] The formula of embodiment 1~4 sees the following table (mass percentage wt%)

[0016]

[0017] The method for thinning pretreatment of the compositions obtained in Examples 1 to 4 is as follows

[0018] The raw material is the TFT glass panel of the same manufacturer and batch of TFT glass AN100, the thickness of which is 1.000mm, and the size is 730mm×92...

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Abstract

A composition for thinning technology pretreatment of a TFT (thin film transistor) glass substrate is characterized by comprising the following ingredients by mass percentage: 10-20% of hydrochloric acid (HCl), 2-5% of hydrofluoric acid (HF), 5-10% of sodium carboxymethylcellulose (CMC-Na), 2-3% of polyvinylpyrrolidone K90 (PVP K90), 10-20% of alcohol, and the balance of water.

Description

technical field [0001] The invention relates to a composition for etching pretreatment of TFT glass substrates. Background technique [0002] TFT (Thin Film Transistor, thin film transistor) display screen is a kind of liquid crystal display screen, and its main structure is liquid crystal material included between two layers of glass substrates. The TFT display screen demanded by the market is becoming more and more ultra-thin. In the manufacture of ultra-thin TFT display screens, the thickness of the glass substrate required is thinner. It is necessary to thin the existing specification glass substrate. The etching solution of hydrofluoric acid is used for thinning treatment. After the thinning treatment, the surface of the glass substrate often has pits caused by local over-etching, and it is necessary to perform a long-term polishing treatment on the surface of the substrate, which seriously affects the production efficiency and improves the production efficiency. Proce...

Claims

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Application Information

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IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 张杰沈励郑建军姚仕军夏伟吴青肖
Owner 天津美泰真空技术有限公司
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