Multistage Magnetic Field Arc Ion Plating Method for Lined Positively Biased Ladder Tube
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An arc ion plating and arc plasma technology, which is applied in the field of material surface treatment, can solve the problems of low arc plasma transmission efficiency and large particle defects, so as to avoid large particle defects, improve crystal structure and stress state, and reduce losses. Effect
Active Publication Date: 2019-08-13
ZHENGZHOU UNIVERSITY OF AERONAUTICS
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[0004] The purpose of the present invention is to solve the traditional arc ion plating method using low-melting point pure metal or multi-element alloy material and non-metallic material (such as graphite) as the target material, which is easy to produce large particle defects, and the arc plasma transmission efficiency caused by the curved magnetic filter technology. Low-level problems, combined with the multi-level magnetic field filtering method and the composite effect of the mechanical barrier shielding of the shape of the stepped tube itself and the positive bias electric field attraction, at the same time ensure that the arc plasma passes through the stepped tube and the multi-level magnetic field with high transmission efficiency The filtering device enables continuous and dense preparation of high-quality thin films on the surface of the workpiece under the condition of applying negative bias voltage, and at the same time realizes the control of element content in the thin film, reduces the production cost of using alloy targets, improves the deposition efficiency of thin films, and reduces large particle defects Detrimental effects on film growth and properties, a multi-stage magnetic field arc ion plating method for lining positively biased stepped tubes was proposed
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specific Embodiment approach 1
[0015] Specific implementation mode one: the following combination figure 1 with 2 Describe the present embodiment, the device used in the multistage magnetic field arc ion plating method of lining positive bias stepped pipe in this embodiment includes a bias power supply 1, an arc power supply 2, an arc ion plating target source 3, a multistage magnetic field device 4, Multi-stage magnetic field power supply 5, lined positive bias stepped tube device 6, positive bias power supply 7, sample stage 8, bias power supply waveform oscilloscope 9 and vacuum chamber 10;
[0016] The method includes the following steps:
[0017] Step 1. Place the substrate workpiece to be processed on the sample stage 8 in the vacuum chamber 10, and insulate the liner positive bias stepped tube device 6 from the vacuum chamber 10 and the multi-stage magnetic field device 4, and connect the workpiece to the sample stage 8. The negative output end of the bias power supply 1, the arc ion plating target...
specific Embodiment approach 2
[0026] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the method also includes:
[0027] Step 3: Thin films can be deposited by combining traditional DC magnetron sputtering, pulsed magnetron sputtering, traditional arc ion plating and pulsed cathodic arc with DC bias, pulse bias or DC pulse composite bias to prepare pure metal films , compound ceramic films with different element ratios, functional films and high-quality films with nano-multilayer or gradient structures.
specific Embodiment approach 3
[0028] Embodiment 3: The difference between this embodiment and Embodiment 2 is that Steps 1 to 3 are repeated to prepare multi-layered thin films with different stress states, microstructures and element ratios, and the others are the same as Embodiment 2.
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Abstract
The invention provides a multi-stage magnetic field electric-arc ion plating method for a lining positive-bias step-shaped pipe and belongs to the technical field of material surface treatment. According to the multi-stage magnetic field electric-arc ion plating method, cleaning of the inner wall, polluted by large particles and deposited ions in a multi-stage magnetic field filtering device, of the pipe is achieved, and the loss in the transferring process of electric-arc plasma is avoided. The multi-stage magnetic field electric-arc ion plating method comprises the following steps that (1) a to-be-film-plated workpiece is placed on a sample table in a vacuum room, a relevant power source is switched on, and an external water-cooling system is started; and (2) thin film deposition is conducted, specifically, when the vacuum degree in the vacuum room is smaller than 10 <-4> Pa, working gas is pumped in, the gas pressure is adjusted, a film plating power source is started; meanwhile, a bias power source is used for attracting the electric-arc plasma at an outlet and conducting energy adjustment; through stop shielding of the lining positive-bias step-shaped pipe, the inhibiting effect of a positive-bias electric field and the filtering effect of a multi-stage magnetic field, large particle defects are effectively eliminated, and transferring efficiency of the electric-arc plasma is guaranteed; and needed technological parameters are set for thin film preparation.
Description
technical field [0001] The invention relates to a multistage magnetic field arc ion plating method for a lined positive bias stepped tube, belonging to the technical field of material surface treatment. Background technique [0002] In the process of preparing thin films by arc ion plating, due to the arc spot current density as high as 2.5~5×10 10 A / m 2 , causing molten liquid metal to appear at the arc spot position on the target surface, which is splashed out in the form of droplets under the action of local plasma pressure, and adheres to the surface of the film or is embedded in the film to form "macroparticles" (Macroparticles) Defects (BoxmanR L, Goldsmith S. Macroparticle contamination in cathodic arc coatings: generation, transport and control [J]. Surf Coat Tech, 1992, 52(1): 39-50.). In the arc plasma, since the movement speed of electrons is much greater than that of ions, the number of electrons reaching the surface of large particles per unit time is greater ...
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