A baffle and a vacuum dryer comprising the baffle

A baffle and panel technology, which is applied in the field of liquid crystal display panel manufacturing, can solve the problems of poor air extraction at the center and uneven air extraction of the array substrate, and achieve the effects of uniform air extraction, avoiding poor air extraction and uniform airflow.
CN106773169BActive Publication Date: 2019-09-17WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
Publication Date
2019-09-17

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Abstract

The invention relates to the technical field of liquid crystal display panel manufacturing, and provides a blocking plate. The blocking plate comprises a first plate face and a second plate face, wherein the first plate face and the second plate face are parallel to each other, the first plate face and the second plate face are arranged at the two sides of the blocking plate respectively, observed from the normal direction of the first plate face, the central area of the blocking plate is provided with a hole, the hole penetrates through the first plate face and the second plate face of the blocking plate, in a vacuum drier, the blocking plate is put above an array substrate to be dried, an exhaust air duct can conduct air exhaust drying on the array substrate directly from the central part of the blocking plate so as to make the airflow path in the central area of the array substrate shorten, the air exhaust effect in the central area of the array substrate is improved, thus the airflow above the array substrate is more even, a central defect caused by unevenness of the air exhaust is avoided, and the quality of a product is improved. The invention provides the vacuum drier comprising the blocking plate at the same time.
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Description

Technical field

[0001] The present invention relates to the technical field of liquid crystal display panel manufacturing, in particular to a baffle and a vacuum dryer including the baffle. The baffle is arranged in an air chamber of the vacuum dryer and located between a substrate to be dried and an exhaust pipe . Background technique

[0002] Photoresist, also known as photoresist, is a light-sensitive mixed liquid composed of three main components: photosensitive resin, sensitizer and solvent. The solvent is mainly organic solvent. After the photosensitive resin is exposed to light, The area can quickly undergo light curing reaction, which makes the physical properties of this material, especially solubility, affinity, etc., undergo significant changes. After proper solvent treatment, the soluble part is dissolved to obtain the desired image.

[0003] In the manufacturing technology of liquid crystal display panels, in the manufacturing process of the array substrate, in the ph...

Claims

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