LED device structure for wafer level package
A LED device and wafer-level packaging technology, which is applied to semiconductor devices, electrical components, circuits, etc., can solve problems such as side leakage of blue light, poor heat dissipation, and low light extraction efficiency, and achieve improved light transmittance, improved overall performance, and increased The effect of light extraction efficiency
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Embodiment 1
[0053] This embodiment provides a wafer-level packaged LED device structure, such as figure 1 As shown, the LED device structure at least includes the following structures: a phosphor substrate, a flip-chip light emitting diode 3 and a first reflector 4 .
[0054] The phosphor substrate includes a transparent substrate 1 and phosphor colloid 2 formed on the surface of the transparent substrate 1 .
[0055]The transparent substrate 1 is a material with high light transmittance, and its light transmittance to blue light (300nm-700nm) is above 95%. For example, it can be a glass substrate or the like. The thickness of the first transparent substrate 1 is in the range of 10-100 μm, for example, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 48 μm, 50 μm, 60 μm, 70 μm, 90 μm, 100 μm, etc. In this embodiment, the thickness of the transparent substrate 1 is preferably 70 μm.
[0056] The fluorescent powder colloid 2 can be formed on the transparent substrate 1 by coating or sintering process, ...
Embodiment 2
[0069] The difference between this embodiment and Embodiment 1 is that, in the LED device structure of wafer-level packaging provided by this embodiment, such as image 3 As shown, the phosphor substrate further includes an isolation substrate 5 formed on the surface of the phosphor colloid 2 . At this time, the phosphor substrate includes: a transparent substrate 1 , an isolation substrate 5 and a phosphor colloid 2 sandwiched between the transparent substrate 1 and the isolation substrate 5 .
[0070] As an example, the flip-chip light emitting diode 3 is bonded to the isolation substrate 5 of the phosphor substrate through a bonding layer 6 (such as silica gel or other resin colloid).
[0071] The transparent substrate with the phosphor colloid 2 is formed by coating or sintering the phosphor colloid 2 between two transparent substrates. The isolation substrate 5 is a material with high light transmittance, and its light transmittance to blue light (300nm-700nm) is above 9...
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Abstract
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