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Mask plate and manufacturing method thereof

A technology of mask plate and mask graphics, which is applied to the photoplate making process, instruments, optics and other directions of the pattern surface, which can solve the problems of uneven height of PS, too many bubbles, yellowing of adsorption, etc., and achieve uniform shape and improved quality effect

Active Publication Date: 2021-11-16
HEFEI BOE OPTOELECTRONICS TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In related technologies, when proximity exposure is used, the height of the PS obtained by exposure is uneven, resulting in a reduction in the process margin of the amount of liquid crystal dripping, resulting in poor reliability such as high-temperature yellowing, adsorption yellowing, and excessive bubbles, which greatly affects product quality.

Method used

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  • Mask plate and manufacturing method thereof
  • Mask plate and manufacturing method thereof
  • Mask plate and manufacturing method thereof

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Embodiment Construction

[0026] In order to make the purpose, technical solution and advantages of the present invention more clear, the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined arbitrarily with each other.

[0027] The steps shown in the flowcharts of the figures may be performed in a computer system, such as a set of computer-executable instructions. Also, although a logical order is shown in the flowcharts, in some cases the steps shown or described may be performed in an order different from that shown or described herein.

[0028] Such as figure 1 As shown, in the proximity exposure process, the mask plate 20 is fixed by the mask frame 30 , and the mask plate 20 exposes the photoresist layer deposited on the color filter substrate and develops to obtain the columnar spacers ...

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Abstract

The invention discloses a mask plate and a manufacturing method thereof. The mask plate includes a light-permeable substrate, a mask pattern formed on the light-transmittable substrate, and the transmittance of the light-transmissible substrate is from Decrease from edge to center. The mask plate provided by the embodiment of the present invention compensates the inconsistency of columnar spacer heights caused by different exposure distances through different transmittances, so that the height of columnar spacers is more uniform, thereby improving the quality of liquid crystal products.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate and a manufacturing method thereof. Background technique [0002] With the development of liquid crystal display technology, large size, high quality, and low cost have become the future development direction. At present, with the pursuit of large size, TFT-LCD (Thin Film Transistor Liquid Crystal Display, Thin Film Field Effect Transistor Liquid Crystal Display) manufacturing continues to develop to a higher generation. [0003] The TFT-LCD panel is mainly composed of a color filter substrate and an array substrate in a box, and a columnar spacer (PhotoSpacer, referred to as PS) is used to isolate the gap for injecting liquid crystal between the two. PS is usually obtained by using a mask to expose the photoresist layer deposited on the color filter substrate and then develop it. The mask plate is a component used for pattern making in the photolithography proces...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/38G03F1/54G02F1/1339G02F1/13
CPCG02F1/1303G02F1/13394G03F1/38G03F1/54G03F1/50G03F1/60G02F1/13398
Inventor 宋萍李红敏董职福薛伟廖力勍
Owner HEFEI BOE OPTOELECTRONICS TECH