Method for preparing strain transducer with different graphene patterns through laser
A strain sensor and graphene technology, applied in the field of strain sensors, can solve the problem that different graphene topology structures cannot be prepared into response sensors, and achieve low-cost effects
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Embodiment 1
[0032] Embodiment 1 Femtosecond laser etching triangular graphene pattern array on polydimethylsiloxane (PDMS)
[0033] Step 1. Preparation of PDMS substrate
[0034] The ratio of DC184 and curing agent is 10:1, stir well to generate air bubbles, put it in an ultrasonic cleaning instrument for 10 minutes, and the air bubbles completely disappear, pour it into a mold (5cm*5cm*1cm) and cure it in an oven at 80°C for 7 hours .
[0035] Step 2. Graphene transfer
[0036] Prepare FeCl with a concentration of 0.5mol / l 3 / HCl solution is used to etch copper, and the graphene / copper foil with an area of 1cm*1cm is cut and placed on the surface of the etching solution. After etching for 4 hours, transfer the graphene to deionized water with filter paper, soak for 1 hour, then transfer to new deionized water, and then transfer to the PDMS substrate described in step 1 after soaking for 1 hour.
[0037] Step 3. Laser preparation of patterned graphene
[0038] The graphene / PDMS surfa...
Embodiment 2
[0041] Embodiment 2 Femtosecond laser etching circular graphene pattern array on polydimethylsiloxane (PDMS)
[0042] Step 1. Preparation of PDMS substrate
[0043] The ratio of DC184 and curing agent is 10:1, stir well to generate air bubbles, put it in an ultrasonic cleaning instrument for 10 minutes, and the air bubbles completely disappear, pour it into a mold (5cm*5cm*1cm) and cure it in an oven at 80°C for 7 hours .
[0044] Step 2. Graphene transfer
[0045] Prepare FeCl with a concentration of 0.5mol / l 3 / HCl solution is used to etch copper, and the graphene / copper foil with an area of 1cm*1cm is cut and placed on the surface of the etching solution. After etching for 4 hours, transfer the graphene to deionized water with filter paper, soak for 1 hour, then transfer to new deionized water, and then transfer to the PDMS substrate described in step 1 after soaking for 1 hour.
[0046] Step 3. Laser preparation of patterned graphene
[0047] The graphene / PDMS surfa...
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