A laser method for fabricating strain sensors with different graphene patterns
A strain sensor and graphene technology, applied in the field of strain sensors, can solve the problem that different pattern graphene topological structures cannot be prepared into response sensors, etc., and achieve the effect of low cost
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Embodiment 1
[0032] Embodiment 1 Femtosecond laser etching triangular graphene pattern array on polydimethylsiloxane (PDMS)
[0033] Step 1. Preparation of PDMS substrate
[0034] The ratio of DC184 and curing agent is 10:1, stir well to generate air bubbles, put it in an ultrasonic cleaning instrument for 10 minutes, and the air bubbles completely disappear, pour it into a mold (5cm*5cm*1cm) and cure it in an oven at 80°C for 7 hours .
[0035] Step 2. Graphene transfer
[0036] Prepare FeCl with a concentration of 0.5mol / l 3 / HCl solution is used to etch copper, and the graphene / copper foil with an area of 1cm*1cm is cut and placed on the surface of the etching solution. After etching for 4 hours, transfer the graphene to deionized water with filter paper, soak for 1 hour, then transfer to new deionized water, and then transfer to the PDMS substrate described in step 1 after soaking for 1 hour.
[0037] Step 3. Laser preparation of patterned graphene
[0038] The graphene / PDMS sur...
Embodiment 2
[0041] Embodiment 2 Femtosecond laser etching circular graphene pattern array on polydimethylsiloxane (PDMS)
[0042] Step 1. Preparation of PDMS substrate
[0043] The ratio of DC184 and curing agent is 10:1, stir well to generate air bubbles, put it in an ultrasonic cleaning instrument for 10 minutes, and the air bubbles completely disappear, pour it into a mold (5cm*5cm*1cm) and cure it in an oven at 80°C for 7 hours .
[0044] Step 2. Graphene transfer
[0045] Prepare FeCl with a concentration of 0.5mol / l 3 / HCl solution is used to etch copper, and the graphene / copper foil with an area of 1cm*1cm is cut and placed on the surface of the etching solution. After etching for 4 hours, transfer the graphene to deionized water with filter paper, soak for 1 hour, then transfer to new deionized water, and then transfer to the PDMS substrate described in step 1 after soaking for 1 hour.
[0046] Step 3. Laser preparation of patterned graphene
[0047] The graphene / PDMS surfa...
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