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Deposition apparatus and deposition method

A technology of deposition device and deposition method, which is applied in the direction of metal material coating process, coating, gaseous chemical plating, etc., can solve the problems of reducing the quality and performance of display devices, so as to reduce the occurrence rate of defects and prevent quality or performance degradation , the effect of preventing heat damage

Active Publication Date: 2019-09-17
CHARM ENG CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Such foreign matter can degrade the quality and performance of the display device

Method used

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  • Deposition apparatus and deposition method
  • Deposition apparatus and deposition method
  • Deposition apparatus and deposition method

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Embodiment Construction

[0087] Hereinafter, embodiments of the present invention will be described in more detail with reference to the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, and various forms can be realized. However, the embodiments of the present invention are provided only to make the disclosure of the present invention more complete, and are provided to inform those skilled in the art of the scope of the present invention. In order to illustrate the embodiments of the present invention, the drawings may be exaggerated or enlarged, and the same symbols in the drawings refer to the same constituent elements.

[0088] figure 1 is a block diagram of a deposition apparatus according to an embodiment of the present invention, figure 2 is a schematic diagram of a chamber portion according to an embodiment of the present invention, image 3 is a schematic diagram showing the bottom of the chamber part according to an embodiment of the...

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Abstract

A deposition apparatus and a deposition method are disclosed. The deposition apparatus comprises a support part, wherein an object to be processed can be placed on the support part; a chamber part, which is arranged on the support part, wherein a processing hole is formed in the bottom of the chamber part and a processing space is formed between the processing hole and the object; a source jet hole, which is formed in the internal circumferential surface of the processing hole; a laser part, which irradiates processing laser to the processing space; and a heating part, which is used to increase the temperature of areas adjacent to laser irradiated areas so as to heat the laser irradiated areas. Moreover, when a film is deposited on an object to be processed through a CVD (chemical vapor deposit) technology, the generation of foreign matters is inhibited or prevented.

Description

technical field [0001] The present invention relates to a deposition device and a deposition method. More specifically, it relates to a deposition device and a deposition method capable of suppressing or preventing generation of foreign matter and preventing thermal damage to a support portion when depositing a thin film on a treatment object by vapor deposition. , It can also prevent raw material dust from flowing out. Background technique [0002] Various display devices have electronic circuits formed on a substrate. For the conductive wire of an electronic circuit, a defect that a part is disconnected or short-circuited may be caused while the circuit is being manufactured or after manufacture. For example, in the manufacturing process of various display devices including LCD (Liquid Crystal Display, liquid crystal display), OLED (Organic Light Emitting Display, organic light emitting diode) or LED (Light Emitting Display, light emitting diode), there are The electrode...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/455C23C16/48
Inventor 朴锺秀许秉舜河度均李振宇卞仁宰林宽洙
Owner CHARM ENG CO LTD