Reflection-type liquid crystal display and manufacturing method thereof
A technology of liquid crystal display and manufacturing method, applied in the directions of instruments, nonlinear optics, optics, etc., can solve the problems of easy light leakage, decreased contrast, limited viewing angle expansion effect, etc., and achieves the effect of reducing light leakage, improving contrast, and expanding viewing angle.
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Embodiment 1
[0028] In order to solve the problems in the aforementioned prior art, the present embodiment provides a reflective liquid crystal display, in which a raised reflective electrode is arranged on the surface of a thin film transistor (TFT) substrate, and at the same time, on the side opposite to the TFT substrate on the color filter substrate There are also raised electrodes on it.
[0029] image 3 A schematic structural diagram of a reflective liquid crystal display according to an embodiment of the present invention is shown. Such as figure 1 As shown, the reflective liquid crystal display includes: an array substrate 301; a gate layer 302 disposed on the array substrate 301; a gate insulating layer 303 disposed on the gate layer 302; an active layer disposed on the gate insulating layer 303 304; the source-drain electrode layer 305 arranged on the active layer 304; the passivation layer 306 arranged on the active layer 304, the source-drain electrode layer 305, and the gat...
Embodiment 2
[0038] This embodiment provides a manufacturing method for manufacturing the reflective liquid crystal display in the first embodiment. The method includes the following steps.
[0039] Step a, sequentially forming a gate layer 302, a gate insulating layer 303, an active layer 304, a source-drain electrode layer 305, and a passivation layer (PVX) 306 on the array substrate 301, and then coating an organic layer 307, the organic layer 307 The material can be resin with a thickness of 2.0 μm;
[0040] Step b, exposing through a mask to form a raised interface with a height of 1.0 μm and a diameter of 10 μm on the surface of the organic layer 307 formed in step a;
[0041] Step c, sputtering a reflective metal, such as Al, Ag, etc., on the organic layer 307 formed in step b, to form a raised reflective electrode 308;
[0042] Step d, sequentially coating black matrix, blue, green, red resist and flat layer (OC) 311 on the color filter substrate 312;
[0043] Step e, exposing t...
Embodiment 3
[0049] This embodiment provides another manufacturing method to manufacture the reflective liquid crystal display in the first embodiment. The method includes the following steps.
[0050] In step a, silicon spheres with a diameter of 3.0 μm are uniformly mixed with an organic material (such as a resin) at a mass ratio of 5.0 wt %;
[0051] Step b, sequentially forming a gate layer 302, a gate insulating layer 303, an active layer 304, a source-drain electrode layer 305, and a passivation layer (PVX) 306 on the array substrate 301, and then coating the mixed material formed in step a to form The organic layer 307 is coated with a thickness of 1.5 μm;
[0052] Step c, sputtering reflective metal silver or aluminum on the organic layer 307, the part of the reflective metal covering the above-mentioned silicon balls forms a raised reflective electrode 308, and the diameter of the raised reflective electrode 308 is 3.5 μm;
[0053] Step d, sequentially coating black matrix, blue...
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Abstract
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