A Reactive Electron Beam Evaporation Equipment with Automatic Target Change
An electron beam evaporation, automatic technology, applied in the direction of vacuum evaporation plating, ion implantation plating, metal material coating technology, etc., can solve the problems of shortened life, increased time cost, unfavorable mass production, etc., and achieve the quality of coating High efficiency, long service life and high coating efficiency
Active Publication Date: 2019-10-18
山东环邦新材料科技有限公司
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Problems solved by technology
[0003] Existing electron beam evaporation equipment generally needs to open the vacuum coating chamber to replace the target when one target is used up, but in a large number of applications, the target needs to be replaced frequently, because the opening and vacuuming of the vacuum chamber require a certain amount of time. Time will increase the cost of time, which will affect the efficiency of evaporation, which is not conducive to mass production; and the frequent use of the third molecular pump will reduce its life; at the same time, frequent opening of the vacuum chamber will cause dust and other impurities to enter Vacuum chamber, which affects the quality of vacuum coating
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[0024] In order to better understand the improvement made by the present invention compared with the prior art, the specific embodiments of the present invention will be described in detail below.
[0025] Such as Figure 2~4As shown, a reactive electron beam evaporation device with automatic target change includes a vacuum coating chamber, an inlet chamber 9 and an outlet chamber 10, the inlet chamber 9 and the outlet chamber 10 are respectively located at two ends of the vacuum coating chamber 1, and the inlet A first valve 11 is provided on the side of the chamber 9 away from the vacuum coating chamber 1, and a second valve 12 is provided on the side connected to the vacuum coating chamber 1; The third valve 13 is provided with a fourth valve 14 on the side away from the vacuum coating chamber 1. The vacuum coating chamber 1 is provided with a first molecular pump, a first mechanical pump and a first air valve. The oral cavity 10 is commonly connected with a second molecul...
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The invention discloses a reaction electron beam evaporation device achieving automatic target replacement. The reaction electron beam evaporation device achieving automatic target replacement comprises a vacuum coating cavity, an inlet cavity, an outlet cavity and an automatic target replacing device. The inlet cavity and the outlet cavity are located at the two ends of the vacuum coating cavity correspondingly. The side, far away from the vacuum coating cavity, of the inlet cavity is provided with a first valve. The side, connected with the vacuum coating cavity, of the inlet cavity is provided with a second valve. The side, connected with the vacuum coating cavity, of the outlet cavity is provided with a third valve. The side, far away from the vacuum coating cavity, of the outlet cavity is provided with a fourth valve. The vacuum coating cavity is provided with a first molecular pump, a first mechanical pump and a first gas valve. The inlet cavity and the outlet cavity are jointly connected with a second molecular pump and a second mechanical pump. The inlet cavity is provided with a second gas valve. The outlet cavity is provided with a third gas valve. An electron beam gun, a plasma generator and a coating material frame are arranged in the vacuum coating cavity. The electron beam gun is arranged outside the vacuum coating cavity, a gun head penetrates through the vacuum coating cavity to enter the vacuum coating cavity. The coating material frame is located on the upper portion of the vacuum coating cavity.
Description
technical field [0001] The invention belongs to the technical field of mechatronics, and in particular relates to a reactive electron beam evaporation device with automatic target change. Background technique [0002] Thin film technology has been widely used in industry, especially in the fields of electronic materials, magnetic materials and components industry. Therefore, the methods of preparing thin films with various properties have also made great leaps in recent decades. develop. [0003] Existing electron beam evaporation equipment generally needs to open the vacuum coating chamber to replace the target when one target is used up, but in a large number of applications, the target needs to be replaced frequently, because the opening and vacuuming of the vacuum chamber require a certain amount of time. Time will increase the cost of time, which will affect the efficiency of evaporation, which is not conducive to mass production; and the frequent use of the third mole...
Claims
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IPC IPC(8): C23C14/30C23C14/56
Inventor 张荣生
Owner 山东环邦新材料科技有限公司