Titanium target material manufacturing method

A manufacturing method and technology for titanium targets, which are applied in the field of titanium target manufacturing, can solve the problems of imperfection, difficulty in meeting production needs of titanium targets, and few processing techniques for high-purity titanium targets, so as to reduce the tendency of deformation and cracking. , The effect of reducing delamination and stabilizing size

Inactive Publication Date: 2017-12-29
宝鸡市铭坤有色金属有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, in the prior art, the processing technology of plastically deforming high-purity titanium ingots to produce high-purity titanium targets for semiconductors involves less and is not perfect. Therefore, it is difficult for the titanium targets produced by forging to meet the requirements of current products. Production needs

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Select titanium powder with a purity of 4N5, melt the titanium powder by atmospheric smelting at a temperature of 600°C, and cast the molten soup. After casting, the molten soup is cooled to form an ingot billet; the ingot billet is immediately subjected to the first heat treatment, and the second The temperature of the first heat treatment is 450°C, the holding time is 0.5h, and then the ingot billet after the heat preservation heat treatment is hot-rolled to form the first titanium billet; the second heat treatment is carried out on the first titanium billet, and the temperature of the second heat treatment is 350 ℃, the holding time is 1h, and then the first titanium billet after the heat preservation heat treatment is hot-rolled to form the second titanium billet; after the second titanium billet is cooled to room temperature, the second titanium billet is cooled at room temperature Rolling to form a cold-rolled billet; annealing heat treatment is performed on the co...

Embodiment 2

[0028] Select titanium particles with a purity of 5N, melt the titanium particles by vacuum smelting at a temperature of 650°C, and cast the molten soup. After casting, the molten soup is cooled to form an ingot billet; the ingot billet is immediately subjected to the first heat treatment, and the second The temperature of the first heat treatment is 500°C, the holding time is 1h, and then the ingot billet after the heat preservation heat treatment is subjected to air hammer forging to form the first titanium billet; the second heat treatment is carried out on the first titanium billet, and the temperature of the second heat treatment is 400 ℃, the holding time is 2h, and then the first titanium billet after the heat preservation heat treatment is subjected to air hammer forging to form the second titanium billet; after the second titanium billet is cooled to room temperature, the second titanium billet is Cold rolling to form a cold-rolled billet; the cold-rolled billet formed...

Embodiment 3

[0030] Select a titanium ingot with a purity of 4N5, melt the titanium ingot by atmospheric smelting at a temperature of 700°C, and cast the molten soup. After casting, the molten soup is cooled to form an ingot blank; the ingot blank is immediately subjected to the first heat treatment, and The temperature of the first heat treatment is 550°C, the holding time is 1.5h, and then the ingot billet after the heat preservation heat treatment is hot-rolled to form the first titanium billet; the second heat treatment is carried out on the first titanium billet, and the temperature of the second heat treatment is 450 ℃, the holding time is 3h, and then the first titanium billet after the heat preservation heat treatment is hot-rolled to form the second titanium billet; after the second titanium billet is cooled to room temperature, the second titanium billet is cooled at room temperature Rolling to form a cold-rolled slab; the cold-rolled slab formed by cold rolling is annealed and he...

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PUM

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Abstract

A method for manufacturing a titanium target disclosed by the invention comprises selecting titanium raw materials, melting the titanium raw materials, casting the molten soup, cooling the cast molten soup to form an ingot billet; immediately performing the first heat treatment, and then heat-keeping The ingot billet after the heat treatment forms the first titanium billet; carries out the second heat treatment, then forms the second titanium billet with the first titanium billet after the heat preservation heat treatment: after the second titanium billet is cooled to room temperature, the second titanium billet is treated under the environment of room temperature The dititanium billet is cold-rolled to form a cold-rolled billet; the cold-rolled billet is annealed and heat-treated to obtain a titanium target billet with fine and uniform grains, and then processed by a machine tool to obtain a titanium target. The present invention makes solid-state diffusion of elements in the titanium billet through multiple heat treatments to reduce the inhomogeneity of chemical composition distribution, reduce the delamination phenomenon of the target blank, and reduce the grain size; at the same time, it can eliminate residual stress and stabilize the size. Reduce hardness and brittleness, increase its plasticity, reduce deformation and crack tendency.

Description

technical field [0001] The invention belongs to the technical field of target processing technology, and in particular relates to a method for manufacturing a titanium target. Background technique [0002] Physical Vapor Deposition (PVD, Physical Vapor Deposition) is widely used in high-end industries such as optics, electronics, and information, such as: integrated circuits, liquid crystal displays (LCD, Liquid Crystal Display), industrial glass, camera lenses, information storage, ships , chemical industry, etc. Metal target components used in PVD are one of the most important raw materials in the manufacturing process of integrated circuits and liquid crystal displays. Titanium (Ti) target is a typical metal target. Because of its good corrosion resistance, good electromagnetic shielding performance, and can be used as an energy material and other important characteristics, it is widely used in PVD. . For example: titanium can be used as a decorative and protective coa...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22F1/18
CPCC23C14/3407C22F1/183
Inventor 沈小利牛会梅
Owner 宝鸡市铭坤有色金属有限公司
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