OLED base plate and manufacturing method thereof
A manufacturing method and substrate technology, applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problems of poor OLED device performance stability, no light emission, weak light emission, etc., and achieve improved light emission uniformity and Performance stability, uniform thickness, and improved uniformity
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[0057] In order to further explain the technical means adopted by the present invention and its effects, the following describes in detail the preferred embodiments of the present invention and the accompanying drawings.
[0058] See figure 2 , The present invention provides a manufacturing method of an OLED substrate, including the following steps:
[0059] Step 1, such as image 3 As shown, a base substrate 10 is provided, and a plurality of anodes 20 arranged at intervals are formed on the base substrate 10;
[0060] Specifically, the base substrate 10 is a transparent substrate, preferably a glass substrate.
[0061] Specifically, the plurality of anodes 20 are formed by a method of magnetron sputtering film formation, the materials of the plurality of anodes 20 include transparent conductive metal oxide, and the film thickness of the anode 20 is between 20 nm and 200 nm. Preferably, the transparent conductive metal oxide is indium tin oxide (ITO).
[0062] Step 2, such as Figure...
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