Washing mechanism for swing drive mechanism of washing machine and washing machine

Abstract

The invention provides a washing mechanism for a swing drive mechanism of a washing machine and the washing machine. The washing mechanism includes a nozzle, a water inlet end and a drainage port, wherein the nozzle is arranged on a chamber of the swing drive mechanism, the water inlet end is connected with the nozzle, and the drainage port is formed in the lower end of the swing drive mechanism;the nozzle and the swing drive mechanism are oppositely arranged, and the water inlet end is arranged outside the chamber. The invention further provides the washing machine. The washing machine includes the washing mechanism for the swing drive mechanism of the washing machine. Compared with the prior art, by arranging the washing mechanism in the swing drive mechanism, a cam disc is washed through the nozzle, therefore, crystal substances attached to the cam disc can be removed in time, the cam disc and other parts are prevented against erosion, and the service life is prolonged; automatic washing is adopted, so that the washing cost is saved; the situation can be avoided that crystal is attached to a substrate again, and the yield of products is increased.

Description

technical field [0001] The invention relates to a display panel technology, in particular to a cleaning mechanism for a swing driving mechanism of a cleaning machine and a cleaning machine. Background technique [0002] In the LTPS (Low Temperature Poly-silicon, low-temperature polysilicon) production process, the substrate will be cleaned before film formation before the ELA (laser annealing) / CVD (chemical vapor deposition) / PVD (physical vapor deposition) process, so that It is necessary to add cleaning equipment before film formation, because the film formation and crystallization pretreatment unit (HF unit) of the cleaning equipment mechanism has a swing drive mechanism (Pipe OSC Driver) for driving the nozzle pipeline. This mechanism has frequent drive parts due to design defects of the original factory There is crystal corrosion phenomenon, which makes the parts easy to be damaged, and the crystallized matter floating into the equipment will affect the product yield; mo...

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Problems solved by technology

[0002] In the LTPS (Low Temperature Poly-silicon, low-temperature polysilicon) production process, the substrate will be cleaned before film formation before the ELA (laser annealing) / CVD (chemical vapor deposition) / PVD (physical vapor deposition) process, so that It is necessary to add cleaning equipment before film formation, because the film formation and crystallization pretreatment unit (HF unit) of the cleaning equipment mechanism has a swing drive mechanism (Pipe OSC Driver) for driving the nozzle pipeline. This mechanism has frequent drive parts due to design defects of the original factory There is crystal corrosion phenomenon, which makes the components easy to be damaged, and the crystals float into the equipment, which will affect the product yield; moreover, the components of the swing drive mechanism need to be replaced frequently, which increases the cost of use

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