Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mask plate and manufacturing method and evaporation method thereof

A manufacturing method and a technology of a mask plate, which are applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve problems affecting alignment accuracy, difficulty in making size alignment holes, and affecting evaporation effects, etc. problems, to achieve the effect of improving manufacturing accuracy, improving alignment accuracy, and improving evaporation effect

Active Publication Date: 2018-02-02
BOE TECH GRP CO LTD
View PDF8 Cites 19 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the large thickness of the mask plate, the accuracy of the alignment holes made on the mask plate is low due to the limitation of the process conditions, and it is difficult to make alignment holes with small sizes, which affects the alignment accuracy. And then affect the evaporation effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask plate and manufacturing method and evaporation method thereof
  • Mask plate and manufacturing method and evaporation method thereof
  • Mask plate and manufacturing method and evaporation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0038] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to illustrate and explain the present invention, and are not intended to limit the present invention.

[0039] As an aspect of the present invention, a mask plate is provided, combined with Figure 1 to Figure 3 As shown, the mask body 10 is included, the mask body 10 is provided with a mask pattern 11, the mask body 10 includes a first surface and a second surface opposite, and a groove 12 is provided on the first surface , the groove 12 is located in the area outside the mask pattern 11 , and the bottom of the groove 12 is provided with a first through hole 13 penetrating through the mask body 10 . It should be understood that the opening of the first through hole 13 is smaller than the size of the bottom surface of the groove 12 .

[0040] The mask plate prov...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
depthaaaaaaaaaa
Login to View More

Abstract

The invention provides a mask plate. The mask plate comprises a mask plate body provided with a mask pattern. The mask plate body comprises a first surface and a second surface which are opposite. Thefirst surface is provided with a groove, the groove is located in the area outside the mask pattern, and a first through hole penetrating the mask plate body is formed in the bottom of the groove. Correspondingly, the invention further provides a manufacturing method and an evaporation method of the mask plate. By means of the mask plate and the manufacturing method and the evaporation method ofthe mask plate, the mask plate alignment precision during evaporation can be improved, and accordingly the evaporation effect is improved.

Description

technical field [0001] The invention relates to the field of manufacturing display devices, in particular to a mask plate, a manufacturing method thereof, and an evaporation method. Background technique [0002] Inkjet printing technology (Inkjet Printing, IJT) is a commonly used technology in the production process of organic electroluminescent display substrates. When inkjet printing is used to form a whole layer structure (such as a cathode layer) in the display area, an open mask is usually used. A film plate (Open Mask), the mask plate is provided with a plurality of evaporation openings. During evaporation, the substrate with multiple display areas can be evaporated using the evaporation source and the open mask, and each evaporation opening on the mask corresponds to a display area on the substrate. Therefore, the manufacturing accuracy and alignment accuracy of the mask directly affect the quality of the display product. [0003] At present, alignment of the mask p...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/04C23C14/24
CPCC23C14/042C23C14/24
Inventor 张微曹鹏
Owner BOE TECH GRP CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com