Photosensitive resin composition and color filter containing the photosensitive resin composition
A technology of photosensitive resin and composition, which is applied in the field of photosensitive resin composition, can solve problems such as limitation of freedom, color purity of color filter, improvement of brightness and contrast ratio, and achieve the effect of improving brightness and excellent adhesion
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[0216] Examples 1-4 and Comparative Examples 1-4 were prepared according to the ratio shown in Table 1 below. The feeding unit of each composition is gram (g).
[0217] [Table 1]
[0218] [Table 1]
[0219]
[0220] Production of the substrate
[0221] The produced compound was spin-coated on SiNx-deposited glass (5 cm×5 cm), and prebaked at 110° C. for 70 seconds to form a film. The distance between the substrate on which the film was formed and the photomask (photo mask) was set to 300 μm, and the entire surface of the substrate was irradiated with 30 mJ / cm using an exposure device. 2 exposure.
[0222] Thereafter, the exposed substrate was developed with a developer (KOH, 0.04%) for 55 seconds, and post baked at 230° C. for 20 minutes to prepare a substrate.
[0223] Pore size determination
[0224] The inner length of the hole was measured with a microspectrophotometer (OSPSP200, manufactured by Olympus Optical Industries, Ltd.) at a ratio of 1000 times with res...
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