Preparation method of Al-doped graded structure tin disulfide gas sensitive material
A gas-sensing material, tin disulfide technology, applied in analytical materials, chemical instruments and methods, material resistance, etc., can solve the problem that the sensor cannot work at room temperature, and achieve the effect of improving sensitivity
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specific Embodiment approach 1
[0017] Specific embodiment one: the preparation method of a kind of Al-doped hierarchical structure tin disulfide gas sensitive material of this embodiment is carried out according to the following steps:
[0018] 1. Add tin tetrachloride pentahydrate into the ethylene glycol solution under the condition of electromagnetic stirring. After the tin tetrachloride pentahydrate dissolves, a mixed solution is obtained. Add thiourea and nine Aluminum nitrate hydrate, magnetically stirred for 10min to 40min to obtain a reaction solution; the molar ratio of tin tetrachloride pentahydrate, thiourea and aluminum nitrate nonahydrate is 1:(1.5~4):(0.01~0.05), the The concentration of tin tetrachloride pentahydrate in the mixed solution is 0.03~0.6mol / L;
[0019] 2. Put the reaction solution obtained in step 1 into a microwave tube, react at a temperature of 170°C to 190°C for 10min to 30min, and then centrifuge. The centrifuged product is first washed with ethanol for 3 to 5 times, and the...
specific Embodiment approach 2
[0020] Specific embodiment 2: The difference between this embodiment and specific embodiment 1 is that the molar ratio of tin tetrachloride pentahydrate, thiourea and aluminum nitrate nonahydrate described in step 1 is 1:2:0.03. Other steps and parameters are the same as those in the first embodiment.
specific Embodiment approach 3
[0021] Specific embodiment three: the difference between this embodiment and specific embodiment one or two is: the molar ratio of tin tetrachloride pentahydrate, thiourea and aluminum nitrate nonahydrate described in step one is 1:2:0.05. Other steps and parameters are the same as those in Embodiment 1 or 2.
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