Mask and filming method and filming device thereof

Abstract

The invention provides a mask and a filming method and a filming device thereof, and relates to the technical field of display and can solve the problem that if a mask pattern in the mask includes aninner convex pattern, when the mask is spread and fixed, the inner convex pattern can be cocking-up due to the uneven tensile force, so that the gap distance between the to-be-filmed base plate and the inner convex pattern is large. The mask includes a shielding part and a hollow area. The shielding part includes a shielding strip and a convex part stretching into the hollow area along the width direction of the shielding strip. The upper surface or the lower surface of the mask pattern is provided with a concave area, wherein the concave area is located or partly located in the convex part.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate, a film forming method, and film forming equipment. Background technique [0002] Organic Light Emitting Diode (OLED) display devices have been widely used in computers, mobile phones, etc. In various electronic devices including electronic products. [0003] In the prior art, fabricating a film structure on a base substrate can usually be accomplished by vacuum evaporation coating, physical vapor deposition film formation or chemical vapor deposition film formation. Among them, for the film structure that needs to be deposited and formed after forming a new substance through a chemical reaction during the gas phase doping process, it is necessary to use the method of chemical vapor deposition to form a film. Chemical vapor deposition is due to its equipment structure Simple, mature process and strong adhesion of the film deposited after the reaction, so it is wid...

AI Technical Summary

Problems solved by technology

[0005] Embodiments of the present invention provide a reticle, its film forming method, and film forming equipment, which can solve the problem of the tension caused by the inner convex pattern when the mask pattern is stretched and fixed when the mask pattern on the reticle includes an inner convex pattern. Unevenness will cause upturning, resulting in a large gap distance between the substrate to be filmed and the convex pattern

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