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Method for guiding a crack in the peripheral region of a donor substrate

A substrate and donor technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, fine working devices, etc., can solve problems such as edge effects

Active Publication Date: 2018-03-20
SILTECTRA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] It has been found that although it is possible to produce a modification in a solid at a distance from the edge of the solid with the aid of a laser beam, this is not readily possible in the region of the edge of the solid due to edge effects.

Method used

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  • Method for guiding a crack in the peripheral region of a donor substrate
  • Method for guiding a crack in the peripheral region of a donor substrate
  • Method for guiding a crack in the peripheral region of a donor substrate

Examples

Experimental program
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Embodiment Construction

[0048] figure 1 Shown are 5 views by which an example of solid sheet fabrication or wafer fabrication according to the invention is shown. See figure 1 A grinding tool 22 is shown here, which has two machining parts 24 spaced apart from one another, which each form a main grinding surface 32 . The main grinding surface 32 is designed in such a way that it produces a recess 6 in the donor substrate 2 . The grinding tool 22 is preferably designed as a rotary grinding tool or as a belt grinding tool.

[0049] figure 1 view of figure 2 A donor substrate 2 is shown in which a recess 6 has been produced by means of a grinding tool 22 . In this case, the recesses 6 are preferably evenly spaced apart from one another in the longitudinal direction of the donor wafer 2 , wherein it is also conceivable for the distances to be of different sizes. according to figure 2 In the second view in FIG. 1 , modification 10 is also produced in donor substrate 2 by means of laser device 46 ...

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PUM

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Abstract

The present invention relates to a method for separating solid wafers (1) from a donor substrate (2). The method comprises the steps of: creating modifications (10) within the donor substrate (2) by means of laser beams (12), wherein the modifications (10) define a detachment region along which separation of the solid layer (1) from the donor substrate (2) takes place, and removing material of thedonor substrate (2), starting from a surface (4) extending in the peripheral direction of the donor substrate (2), in the direction of the centre (Z) of the donor substrate (2), in particular for producing an encircling depression (6).

Description

technical field [0001] The invention according to claim 1 relates to a method for separating a solid sheet from a donor substrate. Background technique [0002] In many technical fields such as microelectronics or photovoltaics, materials such as silicon, germanium or sapphire are often used in the form of sheets and plates (so-called wafers). Conventionally, wafers of this type are currently produced by sawing from an ingot, wherein a relatively large loss of material occurs (“kerf loss”). Since the starting materials used are generally very expensive, there is a strong desire to produce such wafers more efficiently and cost-effectively with less material outlay. [0003] For example, with methods commonly used today, almost 50% of the material used is lost as "kerf loss" only in the production of silicon wafers for solar cells. On a worldwide basis, this corresponds to annual losses of more than 2 billion euros. Since the cost of the wafer accounts for the largest share...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B23K26/00B23K26/0622B23K26/359B23K26/53B23K26/60B23K26/70B28D1/22B28D5/00C03B33/02C03B33/09C03B33/095H01L21/02H01L21/268H01L21/304
CPCB23K26/0006B23K26/0624B23K26/359B23K26/53B23K26/60B23K26/702B23K2101/40B28D1/221B28D5/0005C03B33/02C03B33/091C03B33/0955H01L21/02005H01L21/268H01L21/304C03B33/0222
Inventor 马尔科·斯沃博达克里斯蒂安·拜尔弗朗茨·席林扬·黎克特
Owner SILTECTRA
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