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Inspection method of gas supply system, calibration method of secondary reference device

A calibration method and technology of a reference device, which is applied in the direction of volume measurement instrument/method, volume measurement test/calibration, general control system, etc., can solve the problems of low calculation accuracy, inability to check the change of piping internal volume, and low reliability of gas flow And other issues

Active Publication Date: 2020-04-21
TOKYO ELECTRON LTD
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Problems solved by technology

However, in the above-mentioned first method, since the volume in the piping of the gas supply system is not measured, it is impossible to check the change in the volume in the piping
Therefore, the volume in the piping changes with the lapse of operating time, and as a result, when the responsiveness of the gas changes, it is difficult to identify the cause.
In addition, in the above-mentioned second method, the volume in the piping is calculated using the flow rate value of the flow controller to be corrected, so the calculation accuracy of the volume is low, and as a result, the reliability of the gas flow rate measured using the volume is also low. lower

Method used

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  • Inspection method of gas supply system, calibration method of secondary reference device
  • Inspection method of gas supply system, calibration method of secondary reference device
  • Inspection method of gas supply system, calibration method of secondary reference device

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Embodiment Construction

[0044] Hereinafter, various embodiments will be described in detail with reference to the drawings. In addition, in each drawing, the same code|symbol is attached|subjected to the same or corresponding part.

[0045] figure 1 It is a flowchart showing the inspection method of the gas supply system of one embodiment. figure 1 The method MT1 shown is for example applicable to figure 2 The gas supply system 10 is shown.

[0046] like figure 2 As shown, the gas supply system 10 has n (n is a positive integer) flow controllers FC1, FC2, ..., FCn, piping 12, n valves (a plurality of first valves of the gas supply system) V11, V12, ..., V1n, valve (second valve of the gas supply system) V2, and valve (third valve of the gas supply system) V3. Hereinafter, when no special distinction is required, the n flow controllers FC1, FC2, ..., FCn are referred to as multiple flow controllers FC, and the n valves V11, V12, ..., V1n are referred to as multiple valves V1.

[0047] Each of...

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Abstract

An object of the present invention is to inspect a gas supply system with high accuracy. The method related to one aspect of the present invention includes: a first step of connecting the reference device to the other end of the connecting pipe; a second step of supplying gas from a flow controller to the pipe; a third step of closing a first After the valve, obtain the measured values ​​of the first pressure detector and the first temperature detector; in the fourth step, open the third valve and supply part of the gas in the piping to the storage tank; in the fifth step, obtain the first pressure measurement The measured value of the detector and the first temperature detector or the measured value of the second pressure detector and the second temperature detector; the sixth step uses Boyle-Charlie's law, and based on the measured value obtained in the third step, The volume of the piping is calculated from the measured value obtained in the fifth step and the volume of the closed space including the space in the storage tank when the third valve is closed.

Description

technical field [0001] Embodiments of the present invention relate to a method for checking a gas supply system, a method for calibrating a flow controller, and a method for calibrating a secondary reference device. Background technique [0002] In the manufacture of electronic devices and the like, a substrate is processed using a substrate processing apparatus. A substrate processing apparatus may include a gas supply system for supplying a gas whose flow rate is controlled by a flow controller into a processing container. [0003] The actual output flow rate of the flow controller may slightly change with the lapse of operating time. In this case, a deviation occurs between the set flow rate of the flow controller and the actual output flow rate. In addition, even if the flow controllers are set to the same set flow rate, the actual output flow rate may be different if the manufacturer is different. When the output flow rate of the flow controller is different from the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G05B23/02
CPCG05B23/0213G05B2219/24065G01F22/02G01F25/0092G01F7/005G01D21/02G05D7/0635G01F25/15G01F1/34G01F1/696G01F13/00
Inventor 纲仓纪彦实吉梨沙子
Owner TOKYO ELECTRON LTD
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